The techniques of depositing zinc thin film on grass substrate by vacuum evaporation and direct-current sputtering were investigated with XRD, SEM and AFM in this paper.
本论文对真空蒸发法和直流溅射法沉积锌膜的工艺进行了研究，结合XRD、SEM、AFM等分析手段，以探索这两种方法在制备锌膜方面的一般规律。
The system include pulse cathodic arc ion deposition, direct current cathodic arc ion deposition, magnetic sputtering and electronic beam evaporation technologies.
该系统集脉冲阴极弧离子镀、直流阴极弧离子镀、磁控溅射和电子束蒸发等镀膜工艺以及气体和金属离子注入于一体。
TiO2 thin films were deposited on glass and quartz substrates, respectively, using the direct current reactive magnetron sputtering method.
采用直流磁控反应溅射法，在玻璃和石英基体上制备了TiO2薄膜。
TiO2 thin films were deposited on glass and quartz substrates, respectively, using the direct current reactive magnetron sputtering method.
采用直流磁控反应溅射法，在玻璃和石英基体上制备了TiO2薄膜。
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