• The influence of deposition potential and Na-citrate concentration on composition and morphology of electrodeposited films was studied in detail.

    深入探讨了沉积电位和柠檬酸钠浓度对预制层的形貌和成分的影响规律。

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  • The movement of sediment particles of a particular size beyond a potential site of deposition to some other place.

    一种特殊粒级的沉积颗粒超越它可能沉积的位置、而被搬到某一其他地方的运动。

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  • In this study, we characterized the submicron microstructure of arterial wall collagen and elastin to evaluate its potential role in regional LDL deposition.

    在本研究中,我们通过研究胶原和弹性蛋白的亚微结构来评估低密度脂蛋白局部沉积的潜在作用。

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  • To study the reaction mechanism of CVD (chemical vapor deposition) reaction system, quantum chemistry methods are proved highly potential.

    量子化学方法在研究化学气相沉积反应体系的反应机理、动力学计算方面有很大的潜力。

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  • This is because that the deposition of the particles will increase the potential energy barrier for de-pining.

    分析表明这和颗粒沉积引起的解附势垒增高有关。

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  • The Deposition mechanism of Lithium on aluminium electrode was studied by using linear sweep voltammetry and potential step method.

    采用线性扫描伏安法和电位阶跃法,研究了锂离子在铝电极上的电极过程机理。

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  • Using a semi empirical quantum mechanical method (PM3), we calculated the potential barriers of reactions of chemical vapor deposition (CVD) diamond films on Si(111) substrate.

    本文采用PM3方法,计算了化学汽相沉积金刚石薄膜成核与生长阶段反应势垒。

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  • It was also found out that the chemical distributions has close relationship with potential distribution on the metal surface with salt particle deposition.

    无机盐颗粒沉积金属表面化学分布与电位分布密切相关。

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  • The research results showed that the deposition technique can add the absorbed amount of polyelectrolyte and cause potential changes in fiber surface.

    研究结果表明:交替沉积技术可以增加聚合电解质在纤维表面的吸附量,并引起纤维表面电位的变化。

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  • Electrochemical deposition is of simple and low cost method, displaying a potential application in the deposition of semiconductor films.

    电化学沉积薄膜技术工艺设备简单成本低,在半导体薄膜制备方面有很好的应用前景。

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  • The formation of "black layer" is also controlled by the nitrogen potential and system temperature in the deposition chamber.

    同时,“黑色层”能否形成还与气氛氮势、体系温度有关。

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  • The formation of "black layer" is also controlled by the nitrogen potential and system temperature in the deposition chamber.

    同时,“黑色层”能否形成还与气氛氮势、体系温度有关。

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