Electroplating: use the principle of electrolysis, the metal and alloy parts deposition in the surface, form even, density, good adhesion of the metal layer process.
电镀：利用电解原理，使金属或合金沉积在制件表面，形成均匀、致密、结合力良好的金属层的过程。
The result shows that breathing intensity, particle diameter and particle density are the three key factors influencing the deposition of inhalational particles.
研究结果表明，呼吸强度、颗粒粒径以及颗粒密度是影响可吸入颗粒物沉积的关键因素。
The relationships of current density with deposition rate, crystal size and hardness of deposit were studied.
研究了电流密度与沉积速度、晶粒尺寸及镀层硬度的关系。
Influences of the incident Angle for wave and plasma parameters such as temperature, density and location of resonance layer on wave traces and power deposition distribution were studied.
研究了等离子体温度、密度和共振层位置等参数及波的入射角对波迹和功率沉积分布的影响。
Relationship between refractive index and packing density of coatings prepared by glancing angle deposition is analyzed and three expressions are given firstly.
从理论上分析了单一膜料倾斜入射沉积时的折射率与填充密度的关系，给出了三种不同的表达式；
Influence of the cathode electric current density, the agitating methods, the concentration and size of diamond powder and the placing methods of substrate on the deposition effect are discussed.
重点对影响金刚石上砂效果的几个关键因素进行了工艺试验，讨论了阴极电流密度、搅拌方式、微粉浓度及尺寸、基体放置方式对沉积效果的影响。
In the present paper, the relation between diamond nucleation density and synthesis conditions is studied for the diamond thin film synthesized by hot filament chemical vapour deposition method.
本文研究了用热灯丝化学气相沉积方法在单晶硅衬底上制备金刚石薄膜时其成核密度与制备条件的关系。
The higher sputtering yield would result from multiple collision, lateral sputtering and high density energy deposition of gas cluster ion beam.
气体离化团束的高溅射产额可能是由于多体碰撞、侧向溅射及高能量密度的照射引起的。
To increase nucleation density, the methods of introducing defects on substrate surface are more effective in the diamond thin films growth by means of the low pressure vapor phase deposition.
在低压气相生长金刚石薄膜过程中，通过在衬底表面引入缺陷，通常是一种行之有效的提高成核密度的方法。
The formation of this change is caused by energy deposition and the surface density of volcano eruption.
形成这一变化的原因是由能量沉积与火山坑的面密度共同作用的结果。
An electroless deposition route was employed to incorporate high density palladium nanowire arrays into the pore channels of mesoporous thin films (MTFs) which served as templates.
利用介孔氧化硅薄膜作为模板，通过无电沉积路线在介孔薄膜孔道内合成了高密度钯金属纳米线阵列。
Laser driven fusion requires a high degree of uniformity in laser energy deposition in order to achieve the high density compression required for sustaining a thermonuclear burn.
为了达到维持热核燃烧所需的高密度压缩状态，激光驱动聚变对光束能量沉积的均匀性提出了很高的要求。
The result also shows that the relative density decreases with either the increasing deposition or the increasing average thickness of the film.
同时发现，随入射率的增大或薄膜厚度的增加，相对密度均逐渐减小。
Analysis shows that the system not only can quantitatively predicate the spatial distribution and temporal change of the dust, but also the source, density in the air, transfer and deposition.
分析表明，预报系统不仅能定性预报沙尘天气的空间分布与时间演变，而且能定量预报沙尘源地、大气中的沙尘浓度、沙尘的输送以及沉降。
It was shown that the film surface defect density could decreased by applying deposition temperature.
结果表明：通过加温可以降低薄膜的表面粗糙度与缺陷密度大小。
The use of pulsed high energy density plasma is a new low temperature plasma technology for material surface treatment and thin film deposition.
脉冲高能量密度等离子体是一项全新的等离子体材料表面处理和薄膜制备技术。
The effects of parameters such as current density, current waveform and organic additives on grain size of deposition layer are described.
阐述了电流密度、电流波形、有机添加剂等工艺参数对沉积层晶粒尺寸的影响；
An ideal was proposed that the quality of vapor deposition diamond films could improved by controlling nucleation density.
并提出了控制成核密度提高沉积质量的思想。
This paper studies the nucleation mechanism of the target-facing sputtering, and the variation of island-density with such parameters as deposition time and substrate temperature.
本文研究了对向靶溅射薄膜的成核机理。给出了在薄膜的生长初期基板上的岛密度随生长条件（如沉积时间、基板温度）的变化。
The unique smoothing and cleaning effects of gas cluster ion beam wou1d result from multiple collision, lateral sputtering and high density energy deposition.
气体离化团束优良的平坦化和清洁化效果可能与照射中多体碰撞、侧向溅射及高能量密度的沉积相关。
The increase of HCP phase content in the nanocrystalline deposits appears as a result of both, the increase in Co2 + ions concentration in the bath and decrease of deposition current density.
镀槽内Co2 +离子浓度增加，同时沉积电流密度减少时，纳米镀层内HCP相含量将上升。
The increase of HCP phase content in the nanocrystalline deposits appears as a result of both, the increase in Co2 + ions concentration in the bath and decrease of deposition current density.
镀槽内Co2 +离子浓度增加，同时沉积电流密度减少时，纳米镀层内HCP相含量将上升。
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