• The holograms were fabricated using a very finely focused ion beam to cut a pattern of extremely small slits just 20 nm across through a thin silicon membrane 30 nm thick.

    全息精细聚焦离子束30n m切割20nm长的极小的裂纹的图案组合而成的。

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  • Optical grade with UV cut-off up to 400 nm, greater optical purity than standard grades.

    光学紫外截止400纳米大于标准等级的光学纯度

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  • Optical grade with UV cut-off up to 400 nm, greater optical purity than standard grades.

    光学紫外截止400纳米大于标准等级的光学纯度

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