The successor heater can be used to supply the radial heat dissipation, and the melt to crystal heat flow is balanced by this process, so that the crystal growth interface became more flatted.
后继加热器通过补充晶体径向的热散失，使得沿生长界面径向的由熔体向晶体的热输运实现平衡，使晶体生长界面更加平坦。
The successor heater can be used to supply the radial heat dissipation, and the melt to crystal heat flow is balanced by this process, so that the crystal growth interface became more flatted.
后继加热器通过补充晶体径向的热散失，使得沿生长界面径向的由熔体向晶体的热输运实现平衡，使晶体生长界面更加平坦。
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