Carried through kinematic analysis for napping the CMP process of ring polishing machine, and presented pace vector and track equation about one point relative to examination piece on polishing pad.
对修正环形抛光机CMP过程进行运动分析，给出研磨盘上一点相对于工件的速度矢量与轨迹方程。
Carried through kinematic analysis for napping the CMP process of ring polishing machine, and presented pace vector and track equation about one point relative to examination piece on polishing pad.
对修正环形抛光机CMP过程进行运动分析，给出研磨盘上一点相对于工件的速度矢量与轨迹方程。
应用推荐