Objective:To derive the energy spread function of the electron pencil beam model from the measured beam profiles.
目的：探讨用离轴比曲线分析电子束照射野笔形束模型能量展宽函数的方法。
By analyzing the spread function and development contrast curve, we hypothesized that the resolution limit of electron-beam lithography is primarily limited by developer-diffusion.
通过对电子束扩散函数与显影对比度的分析，本文认为电子束曝光的分辨极限与显影液在纳米尺度下的扩散限制有关。
By analyzing the spread function and development contrast curve, we hypothesized that the resolution limit of electron-beam lithography is primarily limited by developer-diffusion.
通过对电子束扩散函数与显影对比度的分析，本文认为电子束曝光的分辨极限与显影液在纳米尺度下的扩散限制有关。
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