The proximity effect in the E-beam lithography system was verified by experiments.
利用电子束曝光机完成有关邻近效应的实验。
The high speed Patten Generator is designed for nanometer E-beam lithography system.
为满足纳米级电子束曝光系统的要求，设计了高速图形发生器。
The proximity effect in the SDS-3 E-beam lithography system is verified by experiments.
利用SDS - 3电子束曝光机完成有关邻近效应的试验。
DY2001A Electron Beam Lithography System (EBLS) is developed as a practical miniature EBLS.
DY 2001a型电子束曝光机是作为实用化的小型曝光系统而研制的。
During the layerout cutting process for thee beam lithography system, some polygons with one or more inner holes may appear.
电子束曝光机版图切割过程中可能出现带内孔的多边形，并且多边形内环与外环之间可能发生重叠。
The composition, principle and working procedure of the application software of EBES-40A electron beam Lithography system are introduced.
本文简要地介绍了一种圆形电子束曝光机应用软件的结构、工作原理及工作过程；
An imaging system of pattern generator was designed to correct linear distortion of scanning field of ane-beam lithography system, which was composed of both hardware and software.
为实现电子束曝光机扫描场的线性畸变校正，设计了图形发生器的成像系统，该系统包括硬件和软件两部分。
Trial fabrication of digital pixel hologram which are recorded by an electronic beam lithography system to apply to fabrication of embossing hologram for anti counterfeiting and security is described.
作者在研制激光数字点阵全息图的基础上，尝试使用电子束刻蚀系统制作数字像元全息图以期用于防伪和保密模压全息图的制作。
The laser Positioning stage system with hoisting structure which is being developed is the main part of the Electron - beam Lithography Machine.
正在研制的激光定位吊装结构工作台系统是电子束曝光机的主要组成部分。
The development and experiments of electronic controlling system for variable rectangular E-beam lithography and lasser positioning stage are summed in the paper.
本文总结了用于可变矩形电子束曝光机激光定位工件台电控系统的研制及实验经验。
The deflection system of an electron beam lithography tool is used to control deflection scanning of electron beam.
电子束曝光机的偏转系统控制电子束偏转扫描。
In this paper, a unique hoisting structure of laser positioning stage system for electron-beam lithography machine is described.
本文介绍了电子束曝光机激光定位工作台的一种新型吊装结构。
In this paper, a unique hoisting structure of laser positioning stage system for electron-beam lithography machine is described.
本文介绍了电子束曝光机激光定位工作台的一种新型吊装结构。
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