Create a layer Mask for this layer and fill it with black. This will hide all the effect.
为该层建立一个图层蒙版并填充黑色，它将隐藏所有的效果。
Click on the Add a layer mask button at the bottom of the Layers Panel and select the Brush Tool (b).
点击图层面板底部的添加图层蒙版按钮，并选中画笔工具(B)。
I added a layer mask to rendering 2 and began selectively erasing areas that I didn't want showing through.
我在第二个渲染图中添加了一个图层，开始有选择性地擦除我不想呈现出来的区域。
Group all the shapes used to compose the robot and Add a Layer Mask, as previously done, to obtain the following result.
把这些形状归成一组，组成机器人，并添加一个图层蒙版，以前也做过，得到以下结果。
For experienced Photoshop users, I would suggest using a layer mask instead of the eraser tool to maintain more editability.
对于有经验的Ps用户，我建议使用一个图层蒙版，而不是橡皮擦工具，这样可编辑性会更强。
Now we are going to mask out the top right corner of the moon. Click on the Add a layer mask button at the bottom of the Layers Panel.
现在，我们将要遮盖月亮的右上角。点击图层面板底部的添加图层蒙版按钮。
Add a layer mask to this layer as shown below, this will create a better lighting contrast for the hand and make this overall image look better.
按照下面的样子，添加一个图层蒙版，这样可以给整个画面增加整体光的对比度，画面看起来会更好一些。
In order to speed up the reading I will avoid some of the most basic explanations (like how to create a layer mask or how to edit the handlers or Beziers of a vector shape).
为了加快阅读，我会省略一些最基本的解释(比如如何创建一个图层蒙版或如何编辑贝齐尔矢量形状)。
ALT + click in between the new layer with the pink layer to create a mask of the pink layer.
按住alt，点击这个紫色的新图层为其创造一个遮罩。
Then set the layer to Overlay blending mode and use a mask to round off the corners.
然后将这个图层的混合模式设置为叠加，并用蒙版圆滑转角。
This layer is exposed to ultraviolet light through a mask that represents the required pattern.
然后用紫外线通过露光模板的光孔照射到印刷台的粘土层，以此塑造出需要的模型图案。
For this particular layer mask I don't want to create a hard edge so we are going to use the brush tool to manually create our mask.
对于这个层蒙版，我不想有硬边。所以我们选画笔工具手工建立蒙版。
Remember to put it in a new layer and to mask it in the same way.
请记住，把它放在一个新的层，以掩盖它以同样的方式。
A small undesired hole in an oxide opaque region of a mask or reticle or in a photoresist layer.
氧化物、掩模或标线的不透明区域，或光刻层中不需要的小孔。
Select the faceof the 3D object and create a new layer from it. Fill this layer with red. Go toLayer>Create Clipping Mask.
选择3D对象的面并从它创建一个新层。这层填充为红色。转到图层>创建剪贴蒙版。
The mask was made by creating a new layer and moving it to the top of the other layers.
我创建一个图层来进行遮罩，将其移到其它图层的顶部。
The material layer is then patterned using the patterned ashable layer as a mask.
继之，以图案化灰化层为掩模，来图案化材料层。
A layout method for a mask includes creating dummy pattern inhibiting regions and a single dummy pattern type for a layer.
一种掩模的布图方法，包括为一层建立虚设图案抑制区域和单一类型的虚设图案。
Mask the layer and fill it with black. Then using a white brush, paint over the clouds.
蒙版该层并覆盖为黑色，然后运用白色笔刷，把云彩盖上。
The circuit board comprises a dielectric layer, a circuit layer and at least one electricity-conducting joint pole and a solder mask.
一种电路板，其包括介电层、线路层、至少一导电接合柱与焊罩层。
The business card must include at least one vector path, which may be used as a vector mask or a shape layer.
名片必须包括至少一个向量轨迹，该轨迹必须被作为向量屏蔽或成型层面使用。
Now to give it a little punch, duplicate that layer, set its Opacity to 68%, and apply the following Curves (Command + m) to its transparency mask and you get this.
现在，给数码音量图添加一些视觉刺激。复制图层，设置不透明度为68%，并且对透明图层应用下图曲线(COMMAND +M)。然后，你得到了这个。
For the removal of residual layer after template is released during nanoimprint lithography, a new UV-nanoimprint technology without residual layer based on photolithography mask was proposed.
针对纳米压印光刻技术中压印脱模后的留膜去除问题，提出了一种基于光刻版的无留膜紫外纳米压印技术。
Finally, a novel method to detect the profile of the multi-layer dielectric grating mask without any damage is put forward here.
最后论文提出了一种研究多层介质膜光栅掩模的无损检测方法。
Rename this layer as "Tower". Then add a vector mask to this layer, grab the gradient Tool and apply the following gradient to the mask.
命名图层为铁塔图层。然后添加一个蒙板，选择渐变工具，给蒙板添加如下图所示的渐变。
A second insulating layer is formed on the fin exposing a top surface of the mask, wherein a protection layer is deposited between the fin and the second insulating layer.
第二绝缘层形成在鳍部上而暴露了掩模的顶表面，其中保护层沉积在鳍部和第二绝缘层之间。
Antimony-based bismuth-doped thin film, a new kind of super-resolution mask layer, is prepared by magnetron sputtering.
通过磁控溅射法制备了锑基铋掺杂超分辨掩膜材料。
A fin of a semiconductor material having a mask on a top surface of the fin is formed on a first insulating layer.
具有在其顶表面上的掩模的半导体材料的鳍部形成在第一绝缘层上。
A fin of a semiconductor material having a mask on a top surface of the fin is formed on a first insulating layer.
具有在其顶表面上的掩模的半导体材料的鳍部形成在第一绝缘层上。
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