这时就是电浆登场的时候了。
电浆介质可以支持加速电场到相当大的程度。
A plasma medium can support accelerating electric fields of fantastic magnitude.
这个脉冲会马上把气体的电子剥掉而产生电浆。
The pulse immediately strips off the electrons in the gas, producing a plasma.
日冕磁场与电浆原则上应该从两侧水平流入电流片。
Coronal magnetic field and plasma presumably flowed horizontally into the current sheet from both sides.
首先，对电浆物理、PECVD设备及制程原理加以阐述。
First of all, plasma physics, PECVD equipment and its process principles are explained.
这个漩涡不是静止不动的电浆能量场，而是一个活生生的负面实体。
This vortex is not a dead plasma field, it is actually a living entity of a negative nature.
有些透过电极放电产生电浆，有些则是使用线圈磁感应或天线产生的辐射。
Some generate plasmas through electrode-based electric discharge; others use coil-based magnetic induction or antenna-generated radiation.
本文针对电浆辅助化学气相沉积在太阳能产业上的应用作一概略性的介绍。
This paper gives an overview of plasma enhanced chemical vapor deposition used in the solar industry.
在电浆加速器里，加速结构的角色是由电浆(一种离子化的气体)所扮演。
In a plasma accelerator, the role of the accelerating structure is played by the plasma, an ionized gas.
植入物在一个强大电磁场内旋转；这个电磁场可以让电浆产生反重力作用。
It is rotating in a strong magnetic field which produces an antigravitational effect on the plasma.
幸运的是，当雷射或带电粒子穿过电浆时，与电浆的作用可创造出纵向的电场。
Fortunately, when a laser or charged particle beam is sent through a plasma, interaction with the plasma can create a longitudinal electric field.
这种导电现象是否足以把电荷导入地面下，这种放电现象是否能够形成天空中的某种电浆球？
Was that enough to put charge into the ground, and then with the discharge form some kind of plasma ball above?
它的外壳吱吱作响，准备打开——弧形盖板向外折叠，致命的等离子电浆喷薄欲出。
Its carapace seemed to crack open—broad curving plates folded out of the way of its deadly plasma mortar.
地球-月球的电浆通道开启的期间，进入地球的圣光会变多，黑暗也更快速地被清理。
When the Earth. Moon plasma a doorway is open, both the presence of Light and clearing of darkness get magnified.
该项技术也有所提高，电浆火炬的主要成分是一对电极板，主要由以镍为主的合金制成。
The technology has got better, too. The core of a plasma torch is a pair of electrodes, usually made from a nickel-based alloy.
本论文中，我们尝试使用一氧化二氮电浆氮化处理，以改善二氧化铪闸极介电层的品质。
In this thesis, we try to use post-deposition N2O plasma nitridation to improve the HfO2 film quality.
粉尘电浆出现在一些工业加工过程中，如半导体制造，也出现在天体环境中，如土星B环。
They appear in industrial processing, such as semiconductor manufacturing, and also in planetary environments, such as in Saturn's B ring.
主要之制程参数包括气源中之氢气含量、电浆前处理、材偏压、积温度以及电浆导流板之施加。
The main process parameters include hydrogen content in the gas sources, hydrogen plasma catalyst pretreatment, substrate bias, deposition temperature and plasma flow guiding.
负面植入物是电浆型态的黑洞。每个黑洞的直径约为一个电子的大小(10的负17次方公尺)。
An implant is a plasma black hole with an approximate diameter similar to the diameter of an electron (10-17 meters).
负面植入物是电浆型态的黑洞。每个黑洞的直径约为一个电子的大小(10的负17次方公尺)。
An implant is a plasma black hole with an approximate diameter similar to the diameter of an electron (10-17 meters).
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