运用薄膜沉积技术，制作了薄膜应变栅式称重传感器。
The thin-film strain-gauge weighing sensors were fabricated by thin film techniques.
并研究了工艺参数对薄膜沉积速率、硬度和表面粗糙度的影响。
The effect of technical parameters on deposition rate, hardness and surface roughness of DLC films were researched.
脉冲激光薄膜沉积（PLD）是近年来受到普遍关注的制膜新技术。
The pulsed laser deposition (PLD) is a new promising technique for the growth of thin films attended generally by people recently.
本发明提供一种满足根据不同薄膜的生长要求、构造简单的薄膜沉积装置。
This invention provides a film deposition device of simple structure that meets different growth requirements of films.
利用XRD估算纳米镍薄膜的晶粒平均尺寸，探讨纳米镍薄膜沉积生长机理。
The average grain size of nc-Ni films are calculated by using XRD. The deposition and growth mechanism of nc-Ni films are discussed also.
选择可溶性铕盐溶液为原料，利用三电极电化学池在单晶硅片上进行薄膜沉积。
Select a soluble europium salt solution as the raw material, and deposit the thin film on the single crystal silicon wafer by utilizing a three-electrode electrochemical cell.
使用薄膜沉积法和离子束刻蚀法制作16阶菲涅耳透镜，应用于折衍混合CCD相机。
The 16-step Fresnel lens had been fabricated by thin film deposition and ion beam etching and it has been used in refractive-diffractive CCD camera.
阐述了用声阻抗法实时监测薄膜沉积的原理，介绍了一种使用个人计算机的实时测控系统。
A computerized system has been developed for real time, in-situ monitoring and control of thin film growth by deposition.
衍射光学元件的制作技术主要包括激光或电子束直写、反应离子刻蚀、离子束铣及薄膜沉积。
DOE's fabrication techniques mainly include laser beam or electron beam writing, RIE, ion milling and thin film deposition.
一个专有的新型薄膜沉积技术用于氧化锆传感器，在氧化锆元素和铂层之间创建一个分子键。
A proprietary new thin-film deposition technology was used in the zirconia sensor that creates a molecular bond between the zirconia element and the platinum layer.
本文对薄膜沉积的形核、生长过程，对同质外延、异质外延生长过程中的某些现象进行了研究。
Some of the processes involved in thin film nucleation and growth are discussed. Somephenomena presented in homogeneous and heteroepitaxy growth are also investigated.
利用热脉冲技术研究了不同湿度下电晕充电的聚酰亚胺薄膜沉积电荷平均深度向背电极的迁移规律。
The rule of the shift of the mean charge depth at different environmental humidity was discussed for this electret material by heat pulse method.
综述了二元光学元件的常用制作工艺技术，包括台阶刻蚀法、薄膜沉积法、直接写入法、准分子激光加工法和灰阶掩模法。
The common fabrication technologies of binary optical elements were expatiated, including etching, thin-film deposition, direct writing, excimer laser projection and gray-scale masks.
使用薄膜沉积法制作16阶菲涅耳透镜，用它代替常规的光学透镜可实现系统的轻量化、小型化，并增加系统设计的自由度。
The thin film deposition is used to make 16 step Fresnel lens . It can implement system′s lightweight, miniaturization and increase free degree of the design.
使用薄膜沉积法制作1 6阶菲涅耳透镜，用它代替常规的光学透镜可实现系统的轻量化、小型化、增加系统设计的自由度。
We use the thin film deposition to make 16 step fresnel lens, which can obtains lightweight system, miniaturization and increases free degree of the design.
在薄膜沉积和离子束刻蚀技术中，通常要给绝缘基片加上一个射频或脉冲电极，以便在绝缘基片上形成一个自偏压来控制轰击到绝缘基片表面的离子能量。
Self-bias voltage of the dielectric substrate surface and voltage of the driven electrode were experimentally studied to improve the energy control of impinging ion in plasma processes.
而且射频功率、沉积气压等沉积参数的变化对DLC薄膜沉积过程的中性基团、离子基团以及原子氢等成分都有着明显影响，从而最终影响薄膜沉积过程及薄膜性质。
Both RF power and pressure have distinct influence on radical's species and proportion in the DLC films deposition process, and the film's quality is affected finally.
真空沉积法的优势在于它可以制出高品质的薄膜，从而成为高导电性的材料。
The advantage of vacuum deposition is that it's possible to make very high-quality films, which result in materials with higher conductivity.
所以，如果由于不当的处理或空气污染物的沉积而在其表面形成薄膜，则应使用浸了甲醇的泡沫签来清洗。
Therefore, if a resistor acquires surface films from careless handling or deposits from air contaminants, it should be cleaned with a foam-tipped swab and methanol.
提出了一种新颖的多孔硅表面钝化技术，即采用微波等离子体辅助的化学气相沉积（MPCVD）方法在多孔硅上沉积金刚石薄膜。
A novel passivation technology of porous silicon (PS) surface, i. e. , depositing diamond film on the PS surface by microwave plasma assisted chemical vapor deposition (MPCVD) method, was developed.
采用不同的沉积氧气压，分析了其对薄膜微观结构和介电性能的影响。
Study indicated that oxygen deposition pressure exerts a strong impact on the microstructure and the dielectric properties of the films.
采用甚高频等离子体增强化学气相沉积技术制备了不同衬底温度的微晶硅薄膜。
A series of microcrystalline silicon thin films were fabricated by very high frequency plasma-enhanced chemical vapor deposition at different substrate temperatures (T_s).
氧分压和沉积速率对YSZ薄膜残余应力的影响。
Influences of Oxygen Partial Pressure and Deposition Rate on Residual Stress of YSZ Thin Films.
在玻璃衬底上改变实验条件沉积了不同颜色的薄膜，测量了不同色泽薄膜的电阻率和制备条件的关系。
The films of different color were deposited on the glass substrates with different experimental conditions, the resistivity of different color films was measured.
并从二甲亚砜的分子结构及其物理性质对薄膜的沉积的机制进行了探讨。
A possible growth mechanism of DLC films is proposed based on the structure and physical properties of dimethylsulfoxide.
这些方法减少或防止等离子体感应电荷由于无定形碳薄膜的沉积而损坏衬底。
The methods reduce or prevent plasma-induced charge damage to the substrates from the deposition of the amorphous carbon films.
薄膜的制备方法包含很多，主要有化学气相沉积，物理气相沉积和其他一些独特的制备方法。
There are a lot of methods in producing films, including CVD, PVD and some other special methods.
含有金属材料的构件，物理气相沉积靶，薄膜，和形成金属构件的方法。
Components comprising metallic material, physical vapor deposition targets, thin films, and methods of forming metallic components.
从理论上分析了平面磁控溅射靶沉积薄膜的厚度均匀性。
The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
在微波等离子体化学气相沉积装置中，研究了负偏压形核对金刚石薄膜与WC 6 %硬质合金刀具附着力的影响。
The influence of bias enhanced nucleation(BEN) to the adhesion between diamond coating and WC-6%Co carbide cutting tool is researched with the microwave plasma (CVD) instrument.
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