采用化学沉积法和电化学沉积法制备出了泡沫镍。
The foamed nickel manufactured by electroless and electro-deposition is introduced.
在油酸囊泡的层状液晶中利用电化学沉积法成功地制备了银纳米颗粒。
Silver nanoparticles are prepared successfully by an electrochemical deposition in a lamellar liquid crystalline of oleate vesicles.
以聚碳酸酯膜为基底，采用化学沉积法，获得了沉积均匀的金纳米通道。
Main work in the present thesis are shown as follows:1 Au was deposited within the pores of the polycarbonate template membrane using an electroless deposition method.
阐述了淬冷法、化学沉积法、 化学还原浸渍法制备的非晶态合金催化剂的优缺点。
The advantages and disadvantages of the catalysts prepared by rapid quenching method, chemical sediment method, and chemical reduction impregnation method were discussed.
采用化学沉积法在微米级铜粉上镀银，并对得到的镀银铜粉的性能进行测试，对得到的结果进行了分析。
Silver-copper powder was prepared by plating silver on micron sized copper powder, its properties were examined, and the test results obtained were then analyzed in this discussion.
研究所用的碳纳米管是用热灯丝化学气相沉积法合成的。
The carbon nanotubes were synthesized by the heat filament chemical vapor deposition.
实验中所用碳纳米管由化学气相沉积法(CVD)合成。
The carbon nanotubes were synthesized by the heat filament chemical vapor deposition (CVD).
研究了直流等离子体化学汽相沉积（CVD）法合成的金刚石膜内应力随甲烷浓度、沉积温度的变化关系。
The internal stress in diamond thin films deposited by DC plasma CVD was studied as a function of methane concentration and deposited temperature.
本工作利用热丝化学气相沉积(HFCVD)法获得了(100)取向不同质量的金刚石薄膜，并制备了CVD金刚石辐射探测器。
In present work, (100) oriented CVD diamond films with different quality obtained by a hot-filament chemical vapor deposition (HFCVD) technique were used to fabricate radiation detectors.
为了对颗粒表面进行改性，在自行设计组装的流化床反应器中，利用化学气相沉积法(CVD)制备了不同的复合颗粒。
In order to modify the surface properties of the particles, composite particles are prepared by the process of Chemical Vapor Deposition (CVD) in a fluidized bed reactor.
所用的碳纳米管是用热灯丝化学气相沉积法合成的。
Carbon nanotubes in experiments were synthesized by hot filament chemical vapor deposition.
在预处理基底上，采用化学溶液沉积法在低温下制备氧化锌纳米柱薄膜。
Zinc oxide nanopillars are synthesized by chemical solution deposition on a pre-coated substrate at a low temperature.
本文利用热灯丝化学气相沉积法(HFCVD)制备了纳米量级的碳薄膜材料，对它的电学性质及场发射性质进行了详细的研究。
In this dissertation, extensive researches on the electrical and field emission properties of nano-carbon films prepared by hot filament chemical vapor deposition (HFCVD).
近年来，化学气相沉积(CVD)法逐渐应用于车针后续处理过程之中，增强了车针的耐磨性和切削效率。
Recently, chemical vapor deposition (CVD) is gradually used in order to enhance the wear resistance and cutting efficiency of bures.
以镍片为基板材料，利用微波等离子体化学气相沉积法在低温条件下合成了纳米碳管膜。
Carbon nanotube films were synthesized on Ni substrate by microwave plasma chemical vapor deposition at low temperature.
采用热丝化学气相沉积法在覆盖c _(60)膜的硅基片上沉积金刚石膜，研究了金刚石膜的成核与生长。
In this paper, the diamond films were grown on the C_ (60) -coated silicon substrate by using hot-filament chemical vapor deposition technique. The diamond nucleation and growth were studied.
为探讨铝阳极氧化沉积铈转化膜形成机理，分别用化学沉积和电沉积法在铝阳极氧化膜上制备了铈转化膜。
Cerium conversion films were prepared on anodized aluminum via chemical deposition and electrodeposition respectively, and the mechanisms of formation of the cerium conversion films were investigated.
在较佳具体实施例中，该共沉积作用系以等离子体强化化学气相沉积法进行。
In a preferred embodiment, the codeposition is carried out by plasma enhanced chemical vapor deposition.
采用热丝化学气相沉积法(HFCVD)在普通玻璃衬底上低温沉积多晶硅薄膜。
Polycrystalline silicon thin films were prepared by hot-filament chemical vapor deposition (HFCVD) on glass at low-temperatures.
直流热阴极辉光放电等离子体化学气相沉积法是我们建立的快速沉积高品质金刚石膜的新方法。
Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.
多种工艺可以用来制备透明导电薄膜，如磁控溅射真空反应蒸发、化学气相沉积、溶胶-凝胶法以及脉冲激光沉积等。
Many processes are used to prepare transparent conductive films, such as magnetron sputtering, vacuum reactive evaporation, chemical vapor depositions, Sol-gel, laser-pulsed deposition.
之后，利用氨气等离子体促进化学气相沉积法对上述经电镀制程而形成的电镀金属层进行退火处理。
Finally, annealing process is carried out in the electroplated metal layer formed by the electroplating process through chemical vapor deposition method under promotion of ammonia plasma.
本课题利用化学气相沉积(CVD)和热蒸发法在硅片称底和多孔氧化铝(aao)模板上制备纳米硅线。
Silicon nano-wires (SiNWs) were fabricated on Anodized Aluminum Oxide (AAO) template and silicon chips by the Chemical vapor Deposition (CVD) and thermal evaporation method.
脉冲电沉积法可用于制备性能优良的电化学控制离子分离膜电极。
The results show that the NiHCF thin films formed on graphite substrates are suitable for electrochemically controlled ion separation(ECIS) processes.
纳米碳管自1991年被发现以来，目前主要的制备方法有电弧法和化学气相沉积(cvd)法。
Since carbon nanotubes (CNTs) have been discovered in 1991, they are mainly produced by arc-discharge evaporation and Chemical vapor Deposition (CVD) method.
化学气相沉积法是最可行的方法。
研究结果表明：用射频等离子体增强化学气相沉积法，可以在PET上沉积厚度为纳米至微米级的非晶碳氢膜。
The results show: the amorphous hydrogenated carbon film can be fabricated on PET surface by plasma-enhanced chemical vapor deposition.
采用稀土改进的化学镀法在多孔陶瓷载体上共沉积钯-银合金膜。
Rare earth improved electroless plating method was developed for simultaneously depositing Pd-Ag alloy film on ceramic support.
陶瓷薄膜的制备技术多种多样，如物理气相沉积、化学气相沉积、高温烧结和“溶胶-凝胶”法等。
There are many techniques for fabricating ceramic films such as PVD, CVD, high-temperature sintering and sol-gel method.
陶瓷薄膜的制备技术多种多样，如物理气相沉积、化学气相沉积、高温烧结和“溶胶-凝胶”法等。
There are many techniques for fabricating ceramic films such as PVD, CVD, high-temperature sintering and sol-gel method.
应用推荐