• 系统目前在克姆尼茨工业大学亚深工业大学机床企业管理实验室(WZL)合作应运而生。

    At present, this system comes into being under the cooperation between the TU Chemnitz and Laboratory for Machine Tool and Business Management (WZL) of the th Aachen.

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  • 还记得去年三月,阿莉·辛普森澳大利音乐奖偶遇丈夫彼特·温兹,竟不顾身处台上,两人旁若无人分钟

    Last March, Ashlee Simpson-Wentz put her passion for hubby Pete Wentz on display at the MTV Australia Awards. Amid cheers from the crowd, the couple kissed for several minutes onstage.

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  • 并且,俄罗斯西伯利远东地区居民也对中国怀戒心,他们认为后者正在计划劫掠本国的石油木材,甚至这块广袤之地成为中国的殖民地亦未尝不可能

    Residents of Russia's far east fear that China is planning to plunder their oil and timber and perhaps even to colonise their empty spaces.

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  • 2007年速尔群岛海边跳入3米水中抹香鲸共泳时,无法抑制地想表达歉意。

    When, in the summer of 2007, I dove into the three-mile deep waters off the Azores and swam with sperm whales, my overwhelming reaction was to offer my apologies.

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  • 最近夜晚,一时髦哥伦比人和该国的侨民Ben &Josep牛排店里交际应酬。 这是一家两个来自西班牙和比利时合伙人经营的新店,顺着码头木板人行道就可以到达。

    On a recent late-summer evening, a stylish crowd of Colombians and expatriates mingled at Ben &Josep’s, a new steakhouse run by a Spanish-Belgian duo, down the boardwalk from the marina.

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  • 微米集成电路互连线延迟设计十分重视必须解决的问题

    Interconnect wire delay is a very important question that must to be resolved in deep submicron IC design.

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  • 大量实验结果表明:与基于模拟器方法相比采用系统可以快速综合出可制造的微米cmos模拟单元电路

    It has been demonstrated that compared to simulator-based method, manufacturable deep sub-micron CMOS analog circuits can be synthesized using this system in a short run time.

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  • 微米下芯片物理设计面临很多挑战,特别是对于超大规模电路在后端设计流程新的方法

    The deep submicron technology presents lots of new challenges to the physical design of VLSI and new techniques are needed in the back-end design flow.

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  • 集成电路器件特征尺寸进入微米时代后由于微细化和性能方面的影响,一些传统的器件结构不再适用

    With the IC scaling down to deep-sub micro generation, due to the degradation of performance, any conventional device structure is not applicable to IC.

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  • 微米时代随着设计规模变大,时钟频率越来越以及工艺尺寸减小IC物理设计面临着诸多困难。

    In deep submicron era, IC design in physical design has more and more challenge, with the increasing design scale, faster clock frequency and minimizing process dimension.

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  • 光刻校正技术已成为微米下集成电路设计制造关键技术

    The optical lithography correction techniques become key technologies in the IC designing and manufacturing of VDSM.

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  • 硅片上互连线几何变异提取对于微米工艺节点集成电路可制造性设计研究开发极其关键

    Interconnect geometric variation extraction is a key factor for the integrated circuit design for manufacturability research and development, under ultra deep sub-micro process nodes.

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  • 本文综述了微米光刻纳米光刻技术。

    In this article, deep submicron lithography and nano processing are reviewed.

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  • 微米光栅型导光板通过光栅空控制出射光方向、控制调节衍射效率达到导光板出射光强均匀性。

    The transmission angle is controlled by grating frequency and the diffraction efficiency is controlled by groove depth of sub-micro gratings to get uniformity of transmission filed.

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  • 微米纳米级半导体技术迅速进步,使得集成电路设计已经进入系统集成芯片时代

    The rapid progress of semi-conductor technology on deep sub-micro and nanometer scale announces the SOC era of IC design.

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  • 成功地共面线应用微米高速集成电路设计中,并给出了放大器芯片共面线测试结果

    Finally, the coplanar stripline on-chip is successfully used in the design of the high-speed IC's, and some measured results are also given.

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  • 衬底噪声耦合微米混合信号集成电路中常见噪声干扰效应严重地影响模拟电路性能

    Substrate noise coupling effect often occurs in the DSM mixed signal ICs, which seriously interferes the normal performance of the analog circuits.

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  • 随着微米工艺广泛应用,瞬态故障成为芯片失效主要原因

    Since deep submicron manufacturing process is widely used in microprocessors, transient faults have become the main source of chip faults.

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  • 叙述了提高硫酸溶液能力的办法,溶液维护生产应注意的问题。

    The method to improve tin sulfate solution deep-electroplate, solution safeguard and notice in manufacture etc. are narrated.

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  • 针对微米工艺版图设计存在时序收敛问题,提出区域约束版图设计方法。

    A new method for layout design based on region constraints was presented to resolve the timing closure problem of physical design in deep sub-micron technology.

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  • 采用严格耦合波分析(RCWA)理论计算这种一波长光栅衍射效率,分析了它的偏振特性

    The diffractive efficiency of the grating is computed by using rigorous coupled-wave analysis (RCWA). The property of polarization of the grating is also discussed.

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  • 克盐下油田油藏埋藏压力地质条件复杂、钻井难度极大。

    The reservoirs in Kenkyak oilfield are deep and high pressured reservoirs with complicated geological condition.

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  • 微米器件载流子效应(hce)进行了研究

    The hot carrier effects (HCE) in deep sub-micron devices has been studied.

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  • 进入微米工艺后,静态功耗开始动态功耗相抗衡,已成为功耗设计一个不可忽视因素

    In deep sub - micron technology, the mount of the static power catches up with the dynamic power gradually and the standby power is becoming an important factor in low power design.

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  • TLP(传输线脉冲)应力微米ggnmos器件特性失效机理进行了仿真研究

    Based on simulation, the characteristics and mechanisms of failure on a deep sub-micron grounded-gate NMOS (GGNMOS) are studied under TLP (transmission line pulse) stress.

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  • 本文介绍了当今RF设计的主流工艺分别对基于硅微米cmos工艺RF设计中的可行性困难进行了研究,评述了其中存在的问题。

    This paper presented the various technologies in RF design and explored the feasibility and difficulties of deep sub micron CMOS RF design. And problems associated are also discussed.

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  • 提出了用来评估微米vlsi电路rlc互连延时种新的解析延时模型

    This paper presented an innovative analytical delay model for RLC interconnects utilized in the estimation of interconnect delay for deep submicrometer VLSI circuits.

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  • 微米ic设计互连线情况详细布线方案信号波形密切相关

    In IC design under VDSM technology, the crosstalk situation of interconnecting is related nearly with the scheme of detailed routing and the waveforms of signals.

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  • 微米ic设计互连线情况详细布线方案信号波形密切相关

    In IC design under VDSM technology, the crosstalk situation of interconnecting is related nearly with the scheme of detailed routing and the waveforms of signals.

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