An inspection system is provided to examine internal structures of a target material.
提供检查系统以检查目标材料的内部结构。
The prepared target material has the characteristics of P type electricity conduction.
所制备的靶材具有p型导电的特征。
The fraction is dependent on the target material, temperature and incident positron energy.
转换率依赖于靶材料、靶温度和入射慢正电子能量。
Quantitative information is obtained using depth infrared (IR) imaging on the target material.
使用目标材料上的深度红外(IR)成像获得定量的信息。
The target material is used as raw material and a CIGS film can be achieved by further sputtering.
以所述靶材为原料，经一步溅射可获得CIGS薄膜。
The invention relates to a device for improving utilization rate of a high vacuum ion beam sputtering target material.
本发明涉及一种高真空离子束溅镀靶材利用率增强装置。
The invention is simple and economic in technology; the made-up target material is even in component and stable in performance.
该发明制作工艺简单、经济，制成的靶材成分均匀，性能稳定。
The invention relates to a solar battery cuprum-indium-gallium-selenium film key target material and a preparation method thereof.
本发明涉及一种太阳能电池铜铟镓硒薄膜关键靶材及其制备方法。
The target material used for video disk is liable to fracture in production, the higher the density, the stronger is the fracture tendency.
此光盘膜用靶材材料极易在制备过程中碎裂，并且密度越高，裂纹倾向越大。
Using sintered B4C as target material, ternary BCN thin films were synthesized by means of pulsed laser deposition assisted by nitrogen ion beam.
以烧结B4C为靶材料、在氮离子束辅助下用脉冲激光沉积方法制备了三元化合物硼碳氮(BCN)薄膜。
These plasma jets always appear at the boundary between the hot plasma and the cold target material, or between two plasmas with different Z-numbers.
这种类型的等离子体喷流总是出现在热等离子体与冷的固体靶物质的交界处，或者出现在不同原子序数的两种等离子体的交界处。
The magnetron sputtering device can effectively overcome the problem that the prior art is low in target material utilization rate and deposition rate.
其可以有效克服现有技术存在的靶材利用率低和沉积速率低的问题。
The high pressure plasma is created when transient, intensity laser pulse impinges on a black ablative layer painted on the surface of the target material.
激光微冲击成形就是利用脉冲激光产生的高压等离子体的冲击力效应，使超薄板材产生塑性变形的新技术。
This revolving target improved on the usage of target material and uniformity of film thickness comparing with conventional cylindric magnetron sputtering target.
与常规的圆柱形磁控溅射靶相比较，该旋转式靶提高了靶材利用率和膜厚均匀度。
This revolving target improved on the usage of target material and uniformity of film thickness comparing with conventional cylindric magnetron sputtering target.
与常规的圆柱形磁控溅射靶相比较，该旋转式靶提高了靶材利用率和膜厚均匀度。
应用推荐