Additional support came in 1885 when eka-silicon, which had also been described in advance by Mendeleyev, was discovered and named germanium.
1885年，当门捷列夫描述过的埃卡-硅被发现并命名为锗时，也带来了额外的支持。
The development team demonstrated nanowires with layers of the different silicon and germanium materials that were atomically sharp and therefore more efficient at carrying electronic charges.
该技术的研发团队展示了几种原子级尺寸的，采用不同的硅锗材料制成的分层结构纳米线，这种纳米线可以有效地传输电荷。
Gallium arsenide, silicon, and germanium are all examples of semiconductors, the type of material used in virtually all modern electronics.
镓砷化物，硅，和锗元素都属于半导体，而如今半导体在所有的现代电子元件中都会用到。
Both the silicon and the germanium were deposited at high temperatures.
硅和锗都需要在高温下层叠。
It had a 5-in. screen and used 23 silicon and germanium transistors.
它拥有5英寸的屏幕使用了23个硅锗晶体管。
Germanium is already used in many commercial chips simply to improve the speed of electrical circuits, but it has much better optical properties than silicon.
锗早已应用于许多商用芯片中，虽然只是简单地用于提高电路速度，但相对硅来说其拥有好得多的光学性质。
CDMSII operates at extremely low temperatures and detects the energy released when particles hit atoms in germanium and silicon crystals within the detectors.
低温暗物质研究II号在极度低温中进行，并侦测（暗物质）粒子在探测器重撞击锗元素以及硅晶体时释放的能量。
Unlike the materials typically used in lasers, germanium is easy to incorporate into existing processes for manufacturing silicon chips.
有别于通常用于激发激光的物质，锗元素可以很容易的融入目前广泛使用的硅制芯片。
Apart from selenium and vapour - deposited germanium and silicon, glasses are at least diatomic.
除了硒和汽相沉积的锗和硅之外，玻璃至少是二原子的。
Now, as manufacturers see problems with the continued miniaturization of silicon, germanium is experiencing a revival.
现在，制造商们看到硅连续小型化生产存在的问题，因此，锗正经历着复兴之路。
The IBM device is made of Silicon and Germanium, the materials already widely used in production of microprocessor chips.
IBM的设备由硅（Silicon）和锗制造，这些材料已经被广泛用于微处理器芯片产品中。
But as engineers worked out how to make integrated circuits and manufacture them on a large scale, germanium was set aside for silicon because it's easier to work with.
但是就当工程师们找到如何制作集成电路并进行大规模生产时，硅因为更容易使用而取代了锗。
Also, silicon is a very common chemical element, whereas germanium is relatively rare.
除此之外，相对于含量稀少的锗元素，硅是相当普遍的化学元素。
B as is the case with iron, silicon and germanium in their pure state are of little use in industry.
和铁的情况一样，纯净状态的硅和锗在工业上几乎没什么用途。
Germanium has higher electric conductivity than silicon.
锗的导电率比硅高。
Direct distillation, alkaline leaching, alkaline calcinations and HF leaching test were conducted to extract germanium from high silicon material containing germanium.
为从高硅含锗物料中提取锗，进行了直接蒸馏、加碱浸出、加碱焙烧和HF浸出试验。
Some common intrinsic semiconductors are single crystals of silicon, germanium, and gallium arsenide.
常用的本质半导体是硅、锗以及砷化镓等的单晶。
They can be manufactured on such materials as silicon or germanium.
它们可以镀在硅或锗等材料上。
As is the case with iron, silicon and germanium in their pure state are of little use in industry.
和铁的情况一样，纯净状态的硅和锗在工业上几乎没什么用途。
Silicon, germanium and gallium arsenide are popular materials used in ICs and semi-conduct devices, while silicon is the most popular one.
集成电路和各种半导体器件制造中所用的材料，目前主要是硅、锗和砷化镓等单晶体，其中又以硅为最多。
The variable regularity of surface roughness on diamond turned single crystal germanium and silicon was investigated in this paper.
本文研究了金刚石车削单晶锗、硅时表面粗糙度随切削方向的变化规律。
Recently alloys of silicon and germanium have been studied a great deal for possible use in high-speed device and optoelectronics applications.
近年来锗硅合金在高速器件和光电子应用中有大量的可能使用研究。
Optionally, the modules can operate with input voltages as low as 0.25v if you replace the silicon transistors with germanium devices.
随意地，如果用锗晶体管取代硅晶体管，可使模块工作的输入电压最小为0.25V。
The first transistor, created at Bell Labs in 1947, was made of a slab of germanium, an element one spot below silicon in theperiodic table.
1947年，Bell实验室创造了世界上第一个晶体管，该晶体管当时就是用锗板来制备，锗这种元素元素周期表中位于硅的下方。
The gate electrodes (16) of the NMOS transistors (a) are formed in a layer of n-type doped polycrystalline silicon (14) without germanium.
NMOS晶体管(A)的门电极(16)在n -型掺杂的不含锗的多晶硅层(14)上形成。
The electroauxiliaries have two types. One is the organic group which contains silicon, tin, germanium and other element of IVA group, the other contains organothio group.
电辅基共分为两大类，第一类电辅基是由第四主族的元素参与组成的有机基因，而有机硫基团属于第二类电辅基。
Carbon Group (Carbon, Silicon, Germanium, Tin, Lead).
碳族(碳，硅，锗，锡，铅)。
Carbon Group (Carbon, Silicon, Germanium, Tin, Lead).
碳族(碳，硅，锗，锡，铅)。
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