• It utilizes optical phase shifting mask to improve resolution limit for an existing wafer stepper.

    它应用了光学相移掩模方法,大大提高了现有光学光刻设备的分辨率水平。

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  • The sandstone thickness is less than the seismic resolution limit; therefore, it is difficult for us to determine the sandstone thickness with the use of seismic data.

    由于砂层厚度小于现有地震分辨率的极限,所以直接利用地震资料难以测定砂层厚度。

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  • By analyzing the spread function and development contrast curve, we hypothesized that the resolution limit of electron-beam lithography is primarily limited by developer-diffusion.

    通过对电子束扩散函数与显影对比度的分析,本文认为电子束曝光的分辨极限与显影液在纳米尺度下的扩散限制有关。

    youdao

  • By analyzing the spread function and development contrast curve, we hypothesized that the resolution limit of electron-beam lithography is primarily limited by developer-diffusion.

    通过对电子束扩散函数与显影对比度的分析,本文认为电子束曝光的分辨极限与显影液在纳米尺度下的扩散限制有关。

    youdao

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