The use of pulsed high energy density plasma is a new low temperature plasma technology for material surface treatment and thin film deposition.
脉冲高能量密度等离子体是一项全新的等离子体材料表面处理和薄膜制备技术。
The use of pulsed high energy density plasma is a new low temperature plasma technology for material surface treatment and thin film deposition.
脉冲高能量密度等离子体是一项全新的等离子体材料表面处理和薄膜制备技术。
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