The process of nonlinear distortion correction of orthogonal pattern group in E-beam scanning is introduced.
论述了电子束扫描正交图形簇产生畸变的非线性校正过程。
Said thin-film transistor array substrate comprises a first conductive pattern group having grids of the thin-film transistor and select lines connected with the grids;
一种薄膜晶体管阵列基板，其 包括：第一导电图案组，包括薄膜晶体管的栅极和与该栅极相连的选通线；
Said thin-film transistor array substrate comprises a first conductive pattern group having grids of the thin-film transistor and select lines connected with the grids;
一种薄膜晶体管阵列基板，其 包括：第一导电图案组，包括薄膜晶体管的栅极和与该栅极相连的选通线；
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