对区熔后的硅膜结构和电学性质进行了研究。
The structure and electrical properties of silicon film after ZMR are studied.
焊点处形状记忆效应消失，在焊点熔核外热影响区以外形状记忆效应跟母材相同。
The shape memory effect in weld disappear, beyond the HAZ, shape memory effect resume.
同时，对熔凝区的强化机理进行了探讨。
The strengthening mechanism of the remelting zone was also discussed.
同时，对熔凝区的强化机理进行了探讨。
The strengthening mechanism of the remelting zone was also discussed.
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