The process characteristics of growth of semiconductor film are analyzed.
文章分析了半导体薄膜生长工艺流程的特点。
The design of a system platform, APPP process characteristics and numerical control process were investigated.
研究了该系统的平台设计、大气等离子体加工工艺特性及其数控加工过程。
The design of a system platform, APPP process characteristics and numerical control process were investigated.
研究了该系统的平台设计、大气等离子体加工工艺特性及其数控加工过程。
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