Advance a series of parameters to support mask making, process, package and test.
提出工程中要求的一系列参数支持制版、流片、封装和验证。
It is effective to clean photo-mask in less than 10 minutes under the dry process.
其可在小于10分钟内有效的清洁光罩在乾燥制程下。
It is effective to clean photo-mask in less than 10 minutes under the dry process.
其可在小于10分钟内有效的清洁光罩在乾燥制程下。
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