The mask design and the wet etching are both key processes in the technology introduced.
在整套工艺环节中，光掩模版图设计和湿法腐蚀是两个关键步骤。
The design procedures of both circuit and mask pattern are considered.
从电路和版图设计两方面论述了该电路整个设计过程。
The design procedures of both circuit and mask pattern are considered.
从电路和版图设计两方面论述了该电路整个设计过程。
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