The next morning, Scientist Spencer decided to put the magnetron tube near an egg.
第二天上午，科学家斯宾塞决定把磁控管拿到一个鸡蛋旁。
Thus, things turn full circle, for the original microwave oven was based on the magnetron from a military radar.
不过话又说回来，微波炉的磁控管[2]最初就是为军用雷达[3]设计的。
Sm-Co permanent magnets were used in the magnetic circuitry of a coaxial magnetron to produce a small volume, high intensity magnetic field.
将具有优良电磁性能的钐钴永磁用于同轴磁控管磁路系统中，可以以较小体积激励出磁感应强度高的近均匀磁场。
All samples were prepared by rf magnetron sputtering method.
所有样品采用射频辅助磁控溅射方法制备。
The next morning, Spencer decided to put the magnetron near an egg.
第二天早上，斯宾塞决定把它靠近一个鸡蛋。
Repair Engineer: Oh, my God! I got it! The magnetron is out of order.
维修工程师：哦，我的天啊！我找到了。磁控管坏了。
The kinetic process of reactive magnetron sputtering has been studied.
研究了反应磁控溅射的动力学过程。
The glass thin film for optical waveguides is deposited by the magnetron sputtering?
采用磁控射频溅射法制备光波导用玻璃薄膜。
Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering.
采用磁控溅射法制备锰铜薄膜，溅射和真空蒸发法制备镱薄膜。
Reactive magnetron sputtering was used to prepare many kinds of compound films extensively.
反应磁控溅射被广泛应用于制备化合物薄膜。
A novel method to drive magnetron by constant voltage-constant current technique is proposed.
提出了用恒压-恒流技术驱动磁控管的新方法。
Metal aluminum films were deposited on AAO templates by radio-frequency magnetron sputtering.
用射频磁控溅射法在阳极氧化铝模板表面制备了金属铝膜。
The power supply will be convenient for controlling the magnetron sputtering coater automatically.
该电源为磁控溅射镀膜设备实现自动控制提供了方便。
This article presents an introduction to Plasma enhanced, magnetron sputtered deposition Technology.
本文介绍了等离子增强磁控溅射沉积技术。
A new rotating cylindric magnetron sputtering is presented and successfully pro - duced by ourselves.
提出并研制成功了一种新型旋转圆柱形磁控溅射器。
An alternative current medium frequency pulsed magnetron sputtering cathode power supply was introduced.
本文介绍了一种中频交流脉冲式磁控溅射靶极电源。
Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system.
利用低频反应磁控溅射制备五氧化二铌光学薄膜。
A stable plasma in the mirror is produced by using microwave with magnetron at electron cyclotron frequency.
利用工作于电子回旋频率的磁控管发射的微波功率在磁镜中产生了稳定的等离子体。
A magnetron injection electron gun has been developed by the method, which combines synthesis with analysis.
本文采用综合法和分析法相结合的方法，研制了一种磁控注入枪。
The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
从理论上分析了平面磁控溅射靶沉积薄膜的厚度均匀性。
Later, with the klystron and cavity magnetron invention, scientists began to study the nature of centimeter wave.
后来，随着速调管和空穴磁控管的发明，科学家便对厘米波的性质进行研究。
Starting from the dispersion relationship of gyro magnetron, the expression of small-signal gain has been derived.
本文从色散方程出发，导出了回旋磁控管的小信号增益表达式。
Ti-O film was prepared by microwave-electron convolute resonance (MW-ECR) magnetron filter arc deposition process.
采用微波电子回旋共振磁过滤弧设备制备钛氧薄膜。
ZnO: Al thin films were prepared on slide glass substrates by non-reactive DC magnetron sputtering at room temperature.
采用直流磁控溅射工艺，室温下在载玻片上制备了氧化锌铝透明导电薄膜。
The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering.
利用微波ecr等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。
Ultrathin aluminum films were prepared by DC reactive magnetron sputtering. The target was made by 99.999% pure aluminum.
采用直流磁控溅射法溅射纯度为99.999%的铝靶制备了超薄铝膜。
Aluminum film on uranium is prepared using magnetron sputtering with and without circulated argon ion bombardment process.
以磁控溅射沉积方法，采用循环氩离子轰击镀和未循环轰击镀工艺在金属铀上制备了铝薄膜。
Quadrupole mass spectrometer was used to analyze the plasma environment of RF magnetron sputtering PTFE target with pulsed bias.
采用四极质谱仪测量了试验参数对高压脉冲增强射频磁控溅射ptfe靶等离子体气氛的影响规律。
Quadrupole mass spectrometer was used to analyze the plasma environment of RF magnetron sputtering PTFE target with pulsed bias.
采用四极质谱仪测量了试验参数对高压脉冲增强射频磁控溅射ptfe靶等离子体气氛的影响规律。
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