This research shows that the RSNOM could detect the evanescent near field wave effectively, and the image with a super diffraction limit resolution was obtained.
成像研究表明该装置可对近场衰逝分量进行有效探测并实现了超衍射极限成像。
With the continuous improvement of optical lithography limit resolution, the current lithography tool is facing with more and more serious challenge.
随着光学光刻极限分辨率的不断提高，当代光学光刻设备正面临着越来越严重的挑战。
With the continuous improvement of optical lithography limit resolution, the current lithography tool is facing with more and more serious challenge.
随着光学光刻极限分辨率的不断提高，当代光学光刻设备正面临着越来越严重的挑战。
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