Not when placed in dry, clean, no corrosive gas environment.
不用时请放置在干燥、清洁、没有腐蚀性气体的环境中。
Novel methods and apparatuses for annealing semiconductor devices in a high pressure gas environment.
一种用于在高压气体环境中对半导体器件进行退火的新颖方法和设备。
Novel methods and apparatuses for annealing semiconductor devices in a high pressure gas environment.
一种用于在高压气体环境中对半导体器件进行退火的新颖方法和设备。
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