CN films were deposited by radio frequency sputtering technique and the composition and structure of it were investigated by means of XPS, XRD and FTIR.
采用射频磁控溅射法沉积了CN薄膜，利用XPS, XRD, FTIR等测试手段研究了CN薄膜的成分和结构。
Diamond-like carbon DLC thin films were deposited onto si 100 and high speed steel substrates by mid-frequency magnetron sputtering system SP0806AS, Beijing Power tech Co.
采用SP0806AS中频磁控溅射镀膜机，在硅(100)和高速钢基体上，采用双石墨靶在不同功率下沉积了类金刚石薄膜。
ITO thin films were prepared by radio-frequency magnetron sputtering technique at different sputtering power, and applied to HIT solar cells.
采用射频磁控溅射技术在不同射频功率下沉积了ITO薄膜，并将其应用于HIT太阳电池。
An alternative current medium frequency pulsed magnetron sputtering cathode power supply was introduced.
本文介绍了一种中频交流脉冲式磁控溅射靶极电源。
HfOxNy thin films were deposited by radio frequency reactive magnetron sputtering onto multi-spectral ZnS substrates at different oxygen partial pressure.
用磁控反应溅射法在不同氧分压下制备了氮氧化铪薄膜。
Metal aluminum films were deposited on AAO templates by radio-frequency magnetron sputtering.
用射频磁控溅射法在阳极氧化铝模板表面制备了金属铝膜。
Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system.
利用低频反应磁控溅射制备五氧化二铌光学薄膜。
The influence of rotation speed and pendulum amplitude on the thickness uniformity of film deposited by radio frequency magnetron sputtering system with rotation and pendulum was researched.
研究了基片摆动和基片自转的磁控溅射系统中基片摆动角振幅和基片自转角速度对磁控溅射膜厚均匀性的影响。
The hydrogen-free diamond-like carbon(DLC) films were deposited on substrates of Si and M2 high-speed steel using a new mid-frequency dual-magnetron sputtering.
利用新型中频对靶磁控溅射在硅和M2高速钢基体上沉积了一系列无氢含铬类金刚石膜。
The hydrogen-free diamond-like carbon(DLC) films were deposited on substrates of Si and M2 high-speed steel using a new mid-frequency dual-magnetron sputtering.
利用新型中频对靶磁控溅射在硅和M2高速钢基体上沉积了一系列无氢含铬类金刚石膜。
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