Process parameters of SU-8 photoresist based UV-LIGA technique were optimized. The influences of expose time and the wavelength of expose source (on the resist formation) were investigated.
对基于SU - 8胶的UV -LIGA技术进行了工艺优化，研究了光源波长和曝光时间对SU - 8胶成型的影响。
Process parameters of SU-8 photoresist based UV-LIGA technique were optimized. The influences of expose time and the wavelength of expose source (on the resist formation) were investigated.
对基于SU - 8胶的UV -LIGA技术进行了工艺优化，研究了光源波长和曝光时间对SU - 8胶成型的影响。
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