Aluminum foil for capacitor cathode: effect of pretreatment and etching on specific capacitance.
前处理和侵蚀对阴极箔比容的影响。
High aspect ratio structures have been successfully fabricated by plasma cryo-etching on silicon wafers.
等离子体低温刻蚀是一种针对高深宽比结构的干法刻蚀技术。
Defected ground structure (DGS) is a nonperiodic structure proposed in recent years, which means machining various shapes of etching on the ground plane.
即缺陷接地结构，它是近年来提出的一种在微波平面电路接地版上刻蚀出非周期形状的结构。
The influence of quadratic effect of ion-beam etching on pattern profile and the influence of ion-beam etching incidence Angle on slope of pattern sidewall are studied.
介绍了离子束刻蚀的二次效应对图形轮廓以及离子束刻蚀入射角对图形侧壁陡度的影响。
The influence of quadratic effect of ion-beam etching on pattern profile and the influence of ion-beam etching incidence Angle on slope of pattern sidewall are studied.
介绍了离子束刻蚀的二次效应对图形轮廓以及离子束刻蚀入射角对图形侧壁陡度的影响。
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