• The grain boundary energy was measured with thermal etching method.

    用热蚀刻方法测量了合金的晶界能。

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  • The crystal defects were studied by optical method and chemical etching method.

    用光学法和化学腐蚀法研究了晶体的缺陷,并分析了缺陷成因。

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  • The ice etching method was adapted to duplicate the form of grains in microvilli membrane.

    采用冰冻蚀刻法复制微绒毛膜膜内粒子形态。

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  • Ideally shaped cone cathodes have been successfully formed by using a two-step etching method.

    提出了两步腐蚀的工艺方案,制成了形状理想的锥体阴极。

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  • The results of testing show that the silicon (111) crystal plane is very smoothing by etching method.

    测试结果表明,利用腐蚀方法得到的硅的(111)晶面周期结构平整光滑。

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  • In this paper a new method of detecting swirl-defects, an anodic electrolytic etching method, is presented.

    本文报导一种显示漩涡缺陷的新方法——阳极电解付蚀法。

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  • A patterned DLC thin film cathode was fabricated by reactive -ion etching method and mic ro -fabrication technology.

    通过离子束技术和微细加工技术可以实现DLC薄膜的图形化并能大大提高薄膜的场发射性能。

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  • The twins in NYAB and NGAB crystals were investigated by synchrotron radiation topography and chemical etching method.

    采用同步辐射形貌术结合化学腐蚀法,系统研究了NYAB和NGAB晶体中的孪晶结构。

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  • Conclusion The bond strength of self-etching method for bracket can satisfy the qualification of orthodontic treatment.

    结论自酸蚀粘接剂使用简单,粘接强度可靠,能够满足正畸临床需要。

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  • Firstly, PSMs were prepared by the pulsed electrochemical etching method and the experimental conditions were optimized.

    用电化学脉冲腐蚀法制备多孔硅微腔,优化了实验参数。

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  • Austenite grain size of plain carbon steel and alloy steel were examined by oxidization and grain boundary etching method.

    采用氧化法和晶粒边界腐蚀法对几种不同的碳钢和合金钢的奥氏体晶粒的显示进行了对比试验。

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  • The stationary potential deep-etching method is most available than other method to prepare for metallograph analyses on SEM.

    恒电位深腐蚀法是目前已知的制备扫描电镜用试样的最有效的方法。

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  • Experiments are performed to confirm the chemical etching method for defining the crystallographic orientation of silicon single crystals.

    通过实验肯定了硅单晶的化学侵蚀定向方法,找出抛光液的最佳配比及抛光时间。

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  • The chemical etching method wa applied to form surface texture of multicrystalline silicon in order to reduce the reflectance of the surface.

    为了降低光在多晶硅表面的反射,采用化学腐蚀法在其表面制备了绒面。

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  • In addition, by utilizing the secondary wet type etching method, the manufacture process step is simpler, and the technical cost is decreased.

    另外,化学湿式蚀刻的方式可以让制造工艺步骤更简单,技术成本降低。

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  • Patterned porous silicon (PS) films were fabricated based on hydrogen ion implantation technique and typical electrochemical anodic etching method.

    基于氢离子注入技术和典型电化学阳极浸蚀法制备了多孔硅有图(PS)薄膜。

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  • The preparation process of the via hole has simple technology, operability is more convenient than an etching method, and the technology cost is reduced.

    本发明过孔的制备过程工艺简单,操作性比通过刻蚀的方法方便,降低了工艺成本。

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  • Consequently, it is feasible to determine electro-etching method as the sample preparation method about quantitative metallographic analysis in CuCrRE alloy.

    因此,确定电解浸蚀法作为铜铬稀土合金定量金相分析的试样制备方法是切实可行的。

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  • In the study, in order to get good precision of dimension and position of fine leads, chemical etching method is used to make high density double assess single-sided FPC.

    研究采用化学蚀刻聚酰亚胺的方法来制作双面连接的单面挠性板,以满足精细手指的尺寸和位置精度的要求。

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  • Making method of high deep-width rate, batch production of planar windings with LIGA process and silicon deep etching process is researched .

    较深入地研究了以LIGA工艺、硅深刻蚀工艺为主的平面绕阻的高深宽比、批量化制作方法。

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  • The evolution rule of the rare earth aluminum capacitor foil preparation process was investigated by means of bit etching, EBSD micro orientation analysis and X-ray method.

    采用蚀坑法、EBSD微取向分析和X射线法等手段,对稀土电解电容器用铝箔制备过程中的织构演变规律进行了研究。

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  • A method to study the sacrificial layer etching in nanometer is proposed after lots of experiments.

    通过大量的实验研究,建立了一套纳米量级牺牲层腐蚀行为的实验研究方法。

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  • A new method of laser assisted wet etching is proposed, which depends on the etching current characteristic and uniformity of etching image to select the suitable etchant.

    提出了一种激光诱导液相腐蚀新方法——利用腐蚀电流特性和腐蚀图像均匀度相结合的方法,选择出适合的腐蚀溶液。

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  • The influence on over etching and under etching to IC layout is analyzed, the computation model and realization method of IC critical area are presented.

    论文在分析过刻蚀和欠刻蚀对IC版图影响的基础上,提出了基于工艺偏差影响的IC关键面积计算新模型和实现方法。

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  • Crystal etching, a traditional method to study the crystal symmetry and crystal defects, should be a new application in modern mineralogy.

    矿物晶体腐蚀像是一种研究晶体对称、晶格缺陷等传统的方法。

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  • By immersing wet_etch method, slope angle of one_dimension step gratings is studied with fused silica and optimized etching liquor HF.

    用浸没的湿法刻蚀方法,以熔石英为基板刻蚀材料,用优化配方的HF刻蚀液进行刻蚀,研究了HF刻蚀一维光栅台阶的斜坡陡度。

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  • This paper puts forward an online measuring method for measuring the stress in silicon samples prepared with three common micromachining processes: deposition, etching, and bonding.

    针对微加工工艺过程造成的残余应力,文中提出了喇曼在线测量方法,并对最常用的三种微加工工艺:淀积、腐蚀或刻蚀及键合进行了喇曼在线测量。

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  • This paper investigated the law of KPB crystal twinning using microcrystallography, chemical etching and optical method.

    本文采用显微结晶、化学浸蚀和光学方法研究了KPB晶体的孪生规律。

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  • This paper investigated the law of KPB crystal twinning using microcrystallography, chemical etching and optical method.

    本文采用显微结晶、化学浸蚀和光学方法研究了KPB晶体的孪生规律。

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