• These conclusions are essential for designing and improving the deposition process of DLC.

    这些结论对设计与改进DLC的制备工艺具有重要的指导意义。

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  • Two approaches to enhance a stable deposition process are presented.

    描述了提高沉淀工艺稳定性的两种方法。

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  • The HVOF deposition process did not significantly deteriorate the powders used.

    HVOF沉积处理不会使所用粉末很快变质。

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  • Also, the functions of halogen atoms in CVD diamond deposition process are discussed in detail in this paper.

    还详细讨论了卤素原子在金刚石薄膜淀积过程中的作用。

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  • Ti-O film was prepared by microwave-electron convolute resonance (MW-ECR) magnetron filter arc deposition process.

    采用微波电子回旋共振磁过滤弧设备制备钛氧薄膜。

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  • Typical of the dopant chemistry is the reaction for arsine, which is depicted with the deposition process in Fig. 9.

    砷化三氢的反应是典型的掺杂化学反应,图9显示了该反应的淀积过程。

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  • An epitaxial deposition process including a dry etch process, followed by an epitaxial deposition process is disclosed.

    本发明提供一外延沉积工艺,其包含干式蚀刻工艺与后续的外延沉积工艺。

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  • The occurrence of impurities during the deposition process can also be caused by the evaporation of certain substrate materials.

    沉积过程中杂质也可因某些基体材料的蒸发而产生。

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  • The reason why tungsten wire is easy to break in the silicon thin film deposition process by hot wire deposition method was explained.

    揭示了常规热丝法薄膜淀积工艺中热钨丝易断裂的原因。

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  • Spherical nanoscale silicon oxide have been prepared by hydrothermal deposition process using silicon and silica as the starting materials.

    以硅、二氧化硅为原料,采用水热沉积法制备了球状纳米硅氧化物。

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  • The progress in the study of cyanide-free copper electroplating on steel matrix is introduced according to different valences of copper in the deposition process.

    按照沉积过程中铜的价态的不同对在钢铁基体上无氰碱性镀铜的研究进展进行了说明。

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  • The hydrogen and boron ion bombardments were performed by applying a negative bias voltage to the substrate during microwave plasma chemical vapor deposition process.

    在微波等离子体化学气相沉积金刚石膜时,采用负偏压使氢和硼离子轰击金刚石膜表面。

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  • Both RF power and pressure have distinct influence on radical's species and proportion in the DLC films deposition process, and the film's quality is affected finally.

    而且射频功率、沉积气压等沉积参数的变化对DLC薄膜沉积过程的中性基团、离子基团以及原子氢等成分都有着明显影响,从而最终影响薄膜沉积过程及薄膜性质。

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  • The anti-cavitation laser cladding technique for the surface of stainless steel is reviewed. The equipments, deposition process and laser cladding powder are introduced.

    综述了国内外不锈钢抗空蚀激光表面熔覆技术的研究现状,介绍了该技术的特点,设备和抗空蚀熔覆粉末体系。

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  • Solids are consumed during the deposition process. The components used are referred to as feed. Feed consists of a concentrated pigment paste and low-viscosity, milky-colored resin.

    固体份在电沉积过程中被消耗,用作补充的组份称为补加漆料, 补加漆料包括高浓度的颜料浆和低粘度乳白色的树脂。

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  • The relation between characteristics of hot cathode glow discharge and diamond film deposition techniques in hot cathode glow discharge plasma chemical vapor deposition process was discussed.

    研究了在热阴极辉光放电等离子体化学气相沉积金刚石膜过程中,热阴极辉光放电特性与金刚石膜沉积工艺的关系。

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  • Based on the thermal guide theory, we analyzed the melting progress with the cylindroid model in the optical fiber LPHVD (laser plasma hybrid vapour deposition) process.

    利用热传导理论,结合LPHVD工艺,在圆柱体模型基础上分析了光纤工艺中激光熔融过程。

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  • Based on the thermal guide theory, we analyzed the melting progress with the cylindroid model in the optical fiber LPHVD (laser plasma hybrid vapour deposition) process.

    利用热传导理论,结合LPHVD工艺,在圆柱体模型基础上分析了光纤工艺中激光熔融过程。

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