Diamond CVD coating process is introduced to increase the surface hardness of cutting tools.
为增加切削刀具表面硬度引入了钻石化学蒸发沉淀涂层工艺。
Conventional CVD coating process requires a metal compound that will volatilize at a fairly low temperature and decompose to a metal when it contacts with the substrate at higher temperature.
常规的化学蒸发沉淀涂层工艺需要一种容易在相当低温度下挥发并且在较高温度下与基体接触时能分解成纯金属的金属化合物。
Coating by physical vapour deposition (PVD), coating by chemical vapour deposition (CVD) and surface layer modification by ion implantation, all three are being tested and are partly in use.
涂层的化学气相沉积(CVD)和表面层改性的物理气相沉积(PVD)涂层的离子注入，所有三个正在受到考验，并部分使用。
The technical advantages of vacuum plasma spray over conventional chemical vapor deposition(CVD) and air plasma spray in tungsten coating were also discussed.
和CVD方法以及常压等离子体喷涂方法制备的钨涂层相比，低压等离子体喷涂具有明显的优势。
Thus, using this CVD configuration a relatively high deposition rate can be achieved while obtaining desired levels of coating uniformity.
因此，使用所述CVD配置可达到相对较高的沉积速率，同时获得所要程度的涂层均一性。
The influence of bias enhanced nucleation(BEN) to the adhesion between diamond coating and WC-6%Co carbide cutting tool is researched with the microwave plasma (CVD) instrument.
在微波等离子体化学气相沉积装置中，研究了负偏压形核对金刚石薄膜与WC 6 %硬质合金刀具附着力的影响。
The results are valuable for developing CVD diamond coating technology.
研究结果可为涂层工艺的改进提供了理论依据。
In the paper a new method to prolong the working life of the die -cvd diamond coating is introduced.
本文介绍了一种通过CVD金钢石涂层大幅度提高模具寿命的新方法。
The developing status of cutting tool coating technology in home and abroad is summarized. And the features of CVD and PVD coating technology are analyzed.
综述了国内外切削刀具涂层技术的现状，展望了涂层技术的发展前景，分析了CVD和PVD工艺各自具备的优点和不足。
Although the middle wave and long wave transmittance are all increased after multilayer antireflection films were coating on CVD ZnS, the technique of coating must be improved further.
镀多层防反膜以后，中、长红外波段透过率均有所提高，但镀膜技术还有待改进。
Contrasting to the PVD coating in the "line of sight", the CVD can coat all surfaces of the substrate.
与物理蒸发沉淀在“可见范围”对比，化学蒸发沉淀能将基体的所有表面都覆盖。
Contrasting to the PVD coating in the "line of sight", the CVD can coat all surfaces of the substrate.
与物理蒸发沉淀在“可见范围”对比，化学蒸发沉淀能将基体的所有表面都覆盖。
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