左图是一套Applied TetraIII高级掩膜蚀刻系统，如果掩膜板制造商要开发和生产45纳米的掩膜，就必须得使用这套设备。
On the left is an Applied Tetra III advanced reticle-etch system. This system is used by virtually every maskmaker in the world for the development and production of 45-nanometer masks.
在批量蚀刻前是否进行首件与确认蚀刻机设备与线径？
Is a first article run prior to etching the lot to confirm etcher Settings and linewidths?
介绍了激光蚀刻、书写设备中的图形输入方法，着重讨论了图像预处理、直线段识别和圆弧识别的数学方法。
The method for the graphic input in a laser-induced thermal etching system and writing device is described.
所有芯片制造厂都使用类似的设备，包括深反应离子蚀刻工具和晶片键合机。
And all of the foundries utilize similar equipment, which includes deep reactive ion etch tools and wafer bonders.
所有芯片制造厂都使用类似的设备，包括深反应离子蚀刻工具和晶片键合机。
And all of the foundries utilize similar equipment, which includes deep reactive ion etch tools and wafer bonders.
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