• 光白部份则把芒刺激完全磨去。

    Pure white was obtained by entirely effacing the burr and burnishing the plate.

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  • 最后发生的事情已经磨去了他的骄傲。

    The late event had softened away his pride.

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  • 岩石的棱角不是在岁月的海中打磨去了吗?

    Rock individual is not in the years to burnish the sea?

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  • 懒惰能磨去才智的矛头。

    sloth turneth the edge of wit.

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  • 如果出现轻微磨损,可用油石修磨去毛刺后使用。

    If there is slight wear and tear, can be rubbed off glitch Hone repair before use.

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  • 用擦地机配起蜡垫磨去蜡层,然后用吸水机吸干净。

    Cooperate with machine and removing wax mat to remove wax layer then dry.

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  • 辊子打磨---特殊的车床用来磨去和涂布辊的表面。

    Roll grinder a special lathe used to grind down or resurface rubber applicator rolls.

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  • 似乎可以说,熟悉感磨去了错觉的棱角。认识到这一点很重要。

    It is important to realize here how familiarity, so to speak, takes the edge off illusion.

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  • 有下陷或小点等瑕疵的地方应通过砂纸打磨去除瑕疵的方法来修补。

    Defects from runs and sags shall be corrected by sanding to remove the defect.

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  • 按摩可改善血液循环,橄榄油可以滋润皮肤而盐粒可以磨去死皮细胞。

    The massage increases circulation to your skin, the olive oil moisturizes and the salt buffs away dead skin cells.

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  • 我估计没问题,但我琢磨去什么地方,可能稍微远一些,会比较有意思。

    Nick: That's OK I suppose, but I think somewhere else, perhaps just a little further, could be more interesting.

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  • 请帖迅速发出了,不少年轻小姐像范妮一样,当晚就寝时心里乐滋滋地琢磨来琢磨去。

    Invitations were sent with despatch, and many a young lady went to bed that night with her head full of happy CARES as well as Fanny.

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  • 首先,把载片轮流放在三氯乙烯和丙酮溶液池中,用超声清洗若干次,然后用一种中极的研磨去垢剂擦洗。

    The slides are first cleaned ultrasonically several times in alternate baths of trichlorethylene and acetone, and are then scrubbed with a mildly abrasive detergent.

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  • 对国内外有关硬脆材料锯磨去除机理及硬脆材料塑性域锯磨的研究现状进行综述,指出了该领域有待深入研究的问题。

    The research status at home and abroad about the cutting mechanism, the cutting in plastic region of hard and brittle materials when being sawed and grinded are summarized.

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  • 半导体器件上铜层化学机械抛光(CMP)的第一道工序一般需要使用一块硬抛光垫,在磨去阻挡层的工序中要用到软垫。

    Typical chemical mechanical polishing (CMP) of copper layers on semiconductor devices involves using a hard pad in the first step and a soft pad for the barrier layer removal step.

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  • 半导体器件上铜层化学机械抛光(CMP)的第一道工序一般需要使用一块硬抛光垫,在磨去阻挡层的工序中要用到软垫。

    Typical chemical mechanical polishing (CMP) of copper layers on semiconductor devices involves using a hard pad in the first step and a soft pad for the barrier layer removal step.

    youdao

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