本发明提供用于ULSI半导体器件的具有自组装单分子层的铜线及其制造方法。
A copper line having self assembled monolayer for use in ULSI semiconductor devices and methods of making the same are presented.
本发明提供用于ULSI半导体器件的具有自组装单分子层的铜线及其制造方法。
A copper line having self assembled monolayer for use in ULSI semiconductor devices and methods of making the same are presented.
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