并且在实验研究的基础上，分析了激光刻蚀金刚石材料的基本规律。
On the basic of theory, experimental studies on laser cutting and polishing diamond film were carried out.
对液相中的激光表面处理-激光电镀和激光刻蚀进行综述，阐述了有关原理和应用。
Surface treatments in liquid phase using laser-laser plating and laser etching were reviewed. The principle and application of this technique were described.
对液相中的激光表面处理-激光电镀和激光刻蚀进行综述，阐述了有关原理和应用。
Surface treatments in liquid phase using laser-laser plating and laser etching were reviewed.
电池片表面无划伤，但对于在制作过程中采用激光刻蚀工艺的电池的边沿刻蚀线除外。
No scratch allowed, with exception of laser scratched lines for the cells fabricated with laser for edge isolation.
目的：对激光和磷酸刻蚀牙釉质进行比较，探讨激光刻蚀是否可作为酸蚀牙釉质表面的一种替代方法。
Objective: to compare phosphoric acid etched and laser etched human enamel surfaces and evaluate the possibility of using laser etching as a new technique to take place the conventional acid etching.
从鱼身上可以提取制成极其透明的粘胶，在胶片的感光乳胶和光刻蚀工艺的光阻涂层中首先被用作粘合剂。
An exceptionally clear adhesive can be made from fish and was the first adhesive used for photographic emulsions for photo film and photo resist coatings for photoengraving processes.
通过反应离子刻蚀可以将光刻胶微透镜图形转移至这种高性能的聚合物材料上。
Pattern transfer technique is used to transfer photoresist microlens arrays into the polymer underlayer.
提出了优化实验参数、增加束掩模和利用刻蚀技术三种改善原子光刻实验的方法。
Three solutions of optimization of experimental parameters, adding beam mask and using etching technologies for improving atom lithography quality are presented.
制作采用的是传统的光刻、刻蚀工艺。
The sensor is fabricated by traditional lithography and etching.
制备金属光子晶体方法包括：电子束刻蚀结合后续剥离法、激光干涉光刻结合干刻蚀技术等。
The fabrication methods of MPC include electron beam lithography with subsequent evaporation and lift-off, interference lithography with dry-etching technology etc.
本发明探针诱导光刻薄膜用于探针诱导表面等离子体共振光刻将大大降低刻蚀线宽。
When the probe inducing photoetching film is used for probe inducing surface plasma resonance photoetching, the corrosion linewidth is greatly reduced.
系统介绍了芯片实验室的各种制备技术，这些技术包括紫外光刻、软刻蚀、LIGA技术、DEM技术、键合等。
Some polymer materials are used as substrate. Kinds of new microfabrication technology are presented, including lithography, soft etching, LIGA, DEM and bonding, etc.
通过对光刻工艺过程的研究，可为较好地控制正性光刻胶面形，制作微机械、微光学器件提供了参考依据，对微浮雕结构的深刻蚀具有重要的指导意义。
We can better control the positive photoresist figure, provide a reference for making MEMS and MOEMS, it is of an important instructional significance for deep relief of micro structure.
首先，采用紫外光刻和化学湿法刻蚀技术在玻璃基片上加工微米深度的微通道；
The microchannels were firstly constructed on a glass substrate by standard UV photolithography and wet etching technique.
利用电子束光刻、等离子体增强化学气相沉积、感应耦合等离子体刻蚀来实现跑道型微环谐振器的制备；
The optical part can be done by applying Electron Beam Lithography (EBL), Inductively Coupled Plasma (ICP) etching, and Plasma-enhanced Chemical Vapor Deposition (PECVD).
通过深紫外光刻和感应耦合等离子刻蚀设备，制备了所设计的器件。
The designed SOI nanowire AWGs were fabricated using ultraviolet lithography and induced coupler plasma etching.
并将无显影气相光刻的方法应用于这种二氧化硅膜的刻蚀，通过优化后的光刻工艺参数得到了反差明显的光刻图形。
The uniform sol gel derived silicon dioxide film was prepared under optimal conditions. DFVP was applied to etch this film. The photolithography patterns was obtained due to the different etch…
对于光刻胶的去除用热丙酮泡、超声清洗、反应离子刻蚀和高温灰化法相结合，能达到较好的效果。
The other is the removal of SU-8, which can be resolved by the combination of marinating in hot acetone, ultrasonic cleanout, RIE and cineration at high temperature.
对于光刻胶的去除用热丙酮泡、超声清洗、反应离子刻蚀和高温灰化法相结合，能达到较好的效果。
The other is the removal of SU-8, which can be resolved by the combination of marinating in hot acetone, ultrasonic cleanout, RIE and cineration at high temperature.
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