With the protection of photoresist sidewall, the emitter passivation ledge is fabricated by wet etch.

利用光刻胶形成保护侧墙，用湿法腐蚀来形成发射极钝化边沿。

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With the protection of photoresist sidewall, the emitter passivation ledge is fabricated by wet etch.

利用光刻胶形成保护侧墙，用湿法腐蚀来形成发射极钝化边沿。

youdao