Image quality is the key performance of the optical lithography tool and it relies on the performance of wafer focusing and leveling measurement system.
成像质量是光学光刻机的最主要指标，硅片调焦调平测量是光刻机控制成像质量的基础。
The wafer processing system is an important subsystem of the lithography, which consists of a wafer transmission system and a wafer pre-alignment system.
晶圆处理系统是光刻机的重要组成子系统，其包含两个主要部分：晶圆传输系统和晶圆预对准系统。
It can make up the shortage that only the periodic dots or lines can be made when using laser standing wave field to control the atoms to stack on wafer in atom lithography.
弥补了原子光刻技术中利用激光驻波场控制原子堆积只能制作单一量子点、线等周期性图形的不足。
The calculative method of the large field projection lithography lens is presented, and on the distortion measuring setup which is accomplished, distortion measurement of 8 inch wafer is completed.
提出了针对大视场投影光刻物镜畸变的计算方法，并在完成的畸变特性测量装置上进行了8英寸的硅片测量。
Mostly introduction the of detection and the of prealignment technology of the Wafer Loader system in the Projection-Lithography equipment.
介绍投影光刻机设备的晶片传输系统中切边探测和晶片预对准技术。
Mostly introduction the of detection and the of prealignment technology of the Wafer Loader system in the Projection-Lithography equipment.
介绍投影光刻机设备的晶片传输系统中切边探测和晶片预对准技术。
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