The significance of sapphire wafer cleaning in growing of GaN is explained.
阐述了在氮化镓生长中使用的蓝宝石晶片净化的重要性。
Semiconductor wafer processing. Single or dual chamber, 25-wafer batch processing offers high-performance wafer cleaning, rinsing and drying.
半导体晶片处理。单或双室，25晶圆批量处理提供高晶片清洁，冲洗和脱水功能。
Semiconductor wafer manufacturing: batch, semi-automated 25-wafer, single or dual chamber chemical stripping, developing and cleaning tool.
我公司再生产喷雾溶剂工具：半自动化，25晶圆，单或双室化学剥离，研发及清洁工具。
Used for engraving glass, cleaning residue on the sand casting, controlled fermentation, power semiconductor wafer polishing and cleaning corrosion (with HNO3 mixed acid).
用于雕刻玻璃、清洗铸件上的残砂、控制发酵、电抛光和清洗腐蚀半导体硅片(与HNO3的混酸)。
Having the understanding of the wafer preparation, we carried out an evaluation of the tool's backside cleaning.
经过了解晶片的预习处理，我们实现了这种清洗设备背面清洗效果的评价。
It is a gentler cleaning mechanism, less likely to cause damage, and is used in wafer, medical implant, and industrial part cleaning.
它有着比较温和的清洗机制，不大会导致损坏，被用于圆晶、医学移植和工业零件清洗。
A quantitative mechanism of particle removal from silicon wafer surfaces by wet chemical cleaning process was proposed.
对化学法清洗硅片过程中消除颗粒的机理作了定量的探讨。
A quantitative mechanism of particle removal from silicon wafer surfaces by wet chemical cleaning process was proposed.
对化学法清洗硅片过程中消除颗粒的机理作了定量的探讨。
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