• The optical designing process of the monochromator and the VUV beamline confiq…

    本文也详细描述了单色器光学设计程序和同步辐射VUV光束线方案。

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  • A new spectral irradiance calibration method in the UV and VUV region was described.

    描述了一种新的紫外和真空紫外光谱辐照度的定标方法。

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  • The results of impurity VUV radiation observation on the HL 1m device are given in this paper.

    本文介绍了HL -1m装置等离子体杂质真空紫外辐射观测的初步结果。

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  • The measuring principle and method of vacuum ultraviolet(VUV) for color PDP cells had been discussed.

    讨论了彩色PDP显示单元工作时VUV的测试原理与方法。

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  • A laser-produced plasma soft X-ray-VUV source generated with low energy laser system has been designed.

    设计了一种小型激光等离子体软X线-真空紫外光源。

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  • The spectroscopic properties in VUV-Vis spectral region of Pr3 ions in different solids are investigated.

    本项目研究了不同基质中三价镨离子的真空紫外(VUV)光谱特征。

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  • This paper, results of VUV impurity radiation measured in the boronization experiment on the HL-1M Tokamak are given.

    文中叙述了HL - 1m托卡马克硼化真空紫外光谱区杂质辐射的观测结果。

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  • This paper discusses the method of evaluating VUV optical constants of the thin films by the multi-restrained nonlinear equation group.

    本文讨论了通过“多约束非线性方程组”解析真空紫外薄膜光学常数的方法。

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  • The factors affecting the best phase matching condition and the methods to expand the tunable range of VUV output in the weak pump case are discussed.

    特别着重讨论了影响最佳相位匹配的因素和在弱泵浦光条件下增大调谐范围的途径。

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  • The invention provides blue ray emitting fluorescent powder used for a plasma display panel (PDP) or other vacuum ultraviolet (VUV) excitation devices.

    提供用于等离子体显示板(PDP)或其它真空紫外激发(VUV)设备的蓝光发射荧光粉。

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  • Vacuum ultraviolet (VUV) excitation and emission spectra of YAG: Pr3 + at different temperatures are measured using synchrotron radiation as an excitation source.

    在不同温度下用同步辐射的真空紫外光(UV)为激发光源测量了其发射和激发光谱。

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  • Vacuum ultraviolet (VUV) excitation and emission spectra of YAG: Pr 3 + at different temperatures are measured using synchrotron radiation as an excitation source.

    在不同温度下用同步辐射的真空紫外光(VUV)作为激发光源测量了其发射和激发光谱。

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  • An ethylene diffusion flame has been investigated at normal pressure using synchrotron vacuum ultraviolet (VUV) photoionization and molecular-beam mass spectrometry.

    本文利用探针取样法结合同步辐射真空紫外光电离和分子束质谱技术研究了常压下的乙烯扩散火焰。

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  • A testing system for Vacuum Ultraviolet (VUV) fluorescence spectrum radiation in Plasma Display Panel (PDP) is designed for testing and evaluating the properties of PDP phosphor.

    设计等离子体显示板(PDP)真空紫外荧光测试系统来测评PD P荧光粉的特性。

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  • According to the many shortcomings in PDP, and with the theory of quantum cutting and the study of VUV, the paper offers a new idea to prepare high-efficient PDP luminescent material.

    针对目前PD P荧光粉存在的不足之处,从量子剪裁理论与真空紫外光谱出发,对高效PD P荧光粉的研究提出了新思路。

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  • We developed the ground VUV simulation facility for the research of vacuum ultraviolet irradiation and the compound effect of vacuum ultraviolet radiation with other space environments.

    为开展真空紫外辐射及真空紫外线与其它空间环境复合效应的地面模拟实验,研制了真空辐照模拟设备。

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  • The triggering discharges and the vacuum ultra-violet (VUV) radiation of the five-electrode alternating current plasma display panel (AC PDP) were investigated by fluid model simulations.

    采用流体模型研究了一种五电极交流等离子体显示板(ACPDP)的单点触发放电过程及其真空紫外线(VUV)的辐射特性。

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  • Characteristics of a ground aluminium diffuse plate at ultraviolate vacuum ultraviolate(UV VUV)and that of a BaSO 4 and a polytetrafluoroethylene (PTFE) diffuse plate at UV are described.

    给出了正入射条件下铝漫反射板在紫外真空紫外波段的漫反射特性及硫酸钡和聚四氟乙烯(PTFE)漫反射板在紫外波段的漫反射特性;

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  • Most of the quantum cutting systems hitherto is fluoride, which have no practical value due to their low stability, low absorbability and low energy conversion efficiency under VUV exciting.

    科学家们已经证实的量子剪裁体系多为氟化物,由于它们在VUV下的不稳定性和氟化物的活性,以及氟化物基质在VUV波段的弱吸收、能量转换效率低,所以没有实际应用价值。

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  • Some properties of the impurity in the HL-1 tokamak are studied by the VUV spectroscopic method under different discharge conditions: regular, with wall carbonization and with a pumping limiter.

    本文叙述了用真空紫外光谱方法观测HL - 1装置常规、器壁碳化和抽气孔栏三种放电条件下等离子体杂质的变化以及某些杂质的特性。

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  • Some properties of the impurity in the HL-1 tokamak are studied by the VUV spectroscopic method under different discharge conditions: regular, with wall carbonization and with a pumping limiter.

    本文叙述了用真空紫外光谱方法观测HL - 1装置常规、器壁碳化和抽气孔栏三种放电条件下等离子体杂质的变化以及某些杂质的特性。

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