With the augment of sputtering voltage, the growth speed of films became higher accordingly and the relation was nearly linear under the experimented conditions.

随着溅射电压的增大，薄膜的生长速率随之增大，二者近似线性关系。

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With the augment of sputtering voltage, the growth speed of films became higher accordingly and the relation was nearly linear under the experimented conditions.

随着溅射电压的增大，薄膜的生长速率随之增大，二者近似线性关系。

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