Ideally shaped cone cathodes have been successfully formed by using a two-step etching method.
提出了两步腐蚀的工艺方案，制成了形状理想的锥体阴极。
By two-step method with rapid and buffer-sharpener etching, silicon cone array with uniformity and sharpness has been fabricated.
采用快速腐蚀与缓蚀削尖两步工艺，制备出了均匀、尖锐的硅锥阵列。
By two-step method with rapid and buffer-sharpener etching, silicon cone array with uniformity and sharpness has been fabricated.
采用快速腐蚀与缓蚀削尖两步工艺，制备出了均匀、尖锐的硅锥阵列。
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