As the depositing temperature got higher, the transmittance of TiOx thin film in the UV-VIS spectral and the bad-gap would decrease.
溅射温度越高，薄膜在紫外可见光波段内透射越弱，光学带隙越小。
Through testing and analysing on the optoelectronic properties of them, effects of sputtering temperature on TiOx thin films were discussed.
通过对其光电性能的分析测试，探讨了溅射温度对氧化钛薄膜性能的影响。
TiOx thin films at the conditions of different depositing temperatures were on prepared on glass substrates by DC reactive magnetron sputtering.
通过磁控反应溅射，在玻璃基底上制备了不同溅射温度下的氧化钛薄膜。
TiOx thin films at the conditions of different depositing temperatures were on prepared on glass substrates by DC reactive magnetron sputtering.
通过磁控反应溅射，在玻璃基底上制备了不同溅射温度下的氧化钛薄膜。
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