The thick diamond film (0 6 mm) has been synthesized by the combustion flame CVD.
用燃焰法进行了金刚石厚膜的沉积实验，制备了厚度约0。
On the basis of analyzing the semiconducting material removal rate of EDM and making semiconductive modification for CVD diamond thick film by boron-doping, EDM of the thick diamond film was realized.
本文在分析了电火花加工半导体材料去除速率的基础上，通过掺硼对CVD金刚石厚膜进行半导体改性，继而实现了其电火花加工。
It is pointed out that the high speed drilling by using the thick film CVD diamond drill is a good method to get high quality holes.
指出了采用厚膜CVD金刚石钻头进行高速钻削加工是获得高质量孔的良好方法。
Finally, the growth of diamond thick film, nano-diamond thin film, and composite diamond film under the control of computer were explained.
最后介绍了在计算机控制之下金刚石厚膜，纳米金刚石薄膜以及复合膜的生长。
Finally, the growth of diamond thick film, nano-diamond thin film, and composite diamond film under the control of computer were explained.
最后介绍了在计算机控制之下金刚石厚膜，纳米金刚石薄膜以及复合膜的生长。
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