The process was controllable and could be applied to strip the photoresist residual of diffractive optical element fabricated on the thick substrate.
该工艺具有良好的可控性，解决了在厚基片上制作大口径衍射光学元件时残余光刻胶的去除问题。
The process was controllable and could be applied to strip the photoresist residual of diffractive optical element fabricated on the thick substrate.
该工艺具有良好的可控性，解决了在厚基片上制作大口径衍射光学元件时残余光刻胶的去除问题。
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