Internal stresses caused by interfacial electron transfer are also calculated using the modified TFD model.

并基于改进的TFD模型，对任意膜厚下由界面电子转移引起的膜内应力作了理论估算。

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Internal stresses caused by interfacial electron transfer are also calculated using the modified TFD model.

并基于改进的TFD模型，对任意膜厚下由界面电子转移引起的膜内应力作了理论估算。

youdao