On the left is an Applied Tetra III advanced reticle-etch system. This system is used by virtually every maskmaker in the world for the development and production of 45-nanometer masks.
左图是一套Applied TetraIII高级掩膜蚀刻系统，如果掩膜板制造商要开发和生产45纳米的掩膜，就必须得使用这套设备。
On the left is an Applied Tetra III advanced reticle-etch system. This system is used by virtually every maskmaker in the world for the development and production of 45-nanometer masks.
左图是一套Applied TetraIII高级掩膜蚀刻系统，如果掩膜板制造商要开发和生产45纳米的掩膜，就必须得使用这套设备。
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