A series of microcrystalline silicon thin films were fabricated by very high frequency plasma-enhanced chemical vapor deposition at different substrate temperatures (T_s).
采用甚高频等离子体增强化学气相沉积技术制备了不同衬底温度的微晶硅薄膜。
Selfnegative bias on insulate substrate surface of rf glow discharge plasma reactors is studied theoretically. The mathematical analysis has been obtained by equivalent circuit method.
讨论了高频辉光放电等离子体系统中绝缘衬底表面的自负偏压问题，用等效电路方法给出了自负偏压的数学解析。
The experiment of the deposition of diamond thin films is made on silicon substrate by using microwave plasma chemical vapor deposition (CVD) system.
利用微波等离子体化学气相沉积(CVD)设备，在硅基片上进行了金刚石薄膜的沉积实验。
Carbon nanotube films were synthesized on Ni substrate by microwave plasma chemical vapor deposition at low temperature.
以镍片为基板材料，利用微波等离子体化学气相沉积法在低温条件下合成了纳米碳管膜。
Broadly speaking, the embodiments of the present invention provide an improved plasma processing mechanism, apparatus, and method to increase the process uniformity at the very edge of the substrate.
大体而言，本发明的实施例提供了改进的等离子处理机构、设备和方法以提高基片边缘处的处理均匀性。
The plasma display panel includes a first substrate and a second substrate facing each other.
该等离子体显示面板具有彼此面对的第一基底和第二基底。
The plasma processing chamber includes a substrate support configured to receive a substrate.
该等离子处理室包括一个配置为容纳基片的基片支撑件。
To further increase deposition rates, the filament array is biased negatively with respect to the substrate holder so that a DC plasma is also maintained between the substrate and filament array.
为进一步提高沉积速度，对灯丝组施加相对于基底夹持器的负偏压，使得在基底和灯丝组之间的DC等离子体也得以保持。
The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering.
利用微波ecr等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。
The main process parameters include hydrogen content in the gas sources, hydrogen plasma catalyst pretreatment, substrate bias, deposition temperature and plasma flow guiding.
主要之制程参数包括气源中之氢气含量、电浆前处理、材偏压、积温度以及电浆导流板之施加。
Any suitable form of plasma treatment may be used to activate the substrate prior to printing.
可在印刷之前，使用任何合适的等离子体处理形式来活化基片。
Barium strontium titanate (BST) ceramic film is prepared on titanium substrate by micro-plasma oxidation.
用微等离子体氧化法在钛金属基体上制备钛酸锶钡(BST)陶瓷膜。
H plasma treatment changes the bond state between the deposit and substrate, resulting in a improved adhesion of the deposit to cemented carbide.
等离子处理改变了镀层和基体之间的结合状态，提高了镀层与硬质合金的结合强度。
The plasma endotoxin levels of 91 hepatopaths and 20 healthy controls were detected by using a quantitative endotoxin assay of limulus amoebocyte lysate (LAL) test with a chromogenic substrate.
本文采用鲎变形细胞溶解物(LAL)改良基质显色法对91例肝脏病患者和20例健康对照血浆内毒素进行定量检测。
Plasma recondensation on the substrate and growing thin films.
等离子体中粒子在基片上生长薄膜。
Provided is also a plasma display panel which simplifies the manufacturing process by forming all of the electrode-connecting units on the same substrate, thereby reducing the manufacturing costs.
还提供了一种通过在同一基板上形成所有的所述电极连接单元而简化制造工艺，由此降低制造成本的等离子体显示面板。
A microwave plasma processing device and a gas supply member capable of forming a uniform thin film on a substrate to be processed.
本发明提供能够在处理基体上形成均匀的薄膜的微波等离子体处理装置和气体供给构件。
The Fe-based composite coatings were deposited on the attrition spot of cutting pick by plasma jet surface metallurgy, and metallurgical bonding was obtained between the coating and the substrate.
采用等离子束表面冶金技术，在采煤机截齿磨损严重的部位制备了与基材呈冶金结合的铁基复合涂层。
The plasma display panel of the utility model is capable of achieving lower firing voltage and higher lighting effect on the substrate at the same time.
通过本发明提出的新型等离子显示面板，在基板上获得较低的着火电压的同时，能得到更高光效。
The RF self-bias of the substrate in an RF inductively coupled plasma is controlled by changing the impedance of an external circuit inserted between the substrate and the ground.
采用调节射频电感性耦合等离子体中基片电极与地之间的外部电路阻抗的方法，控制基片电极的射频自偏压。
Results indicated that plasma surface metallurgical coating of Fe-Cr-Ni-B-Si had well wettability, and metallurgical bonding was obtained between coating and substrate.
结果表明，等离子表面冶金合金化涂层对基材具有良好的润湿性，基材表面熔化区的形成使得涂层与基材实现了完全的冶金结合。
A plasma display panel including common and scanning electrodes arranged on a first substrate.
本发明涉及一种包括放置在第一基板上的公共及扫描电极的等离子显示板。
The results show that Ar-H2 plasma treatment of the Au substrate leads to a significant enhancement of the uniformity of the copper deposition layer.
结果显示利用氩氢等离子体对金基底材料表面进行处理能有效地提高铜沉积层的均一性。
It is pointed out that the improvement of cohesion properties of interface between coatings and substrate is a key in the research and application of plasma spraying material.
指出了喷涂材料研究应用中仍然存在的问题，也是关键的问题，即涂层与基体的界面结合。
Ta coating was prepared by plasma spraying, which composition and morphology were investigated using SEM, also the bonding strength between Ta coating and Al substrate was tested.
采用等离子喷涂法制备了钽金属涂层，用电子显微镜分析了不同工艺条件下钽涂层的化学成分、表面形貌，测试了涂层与基材的结合强度。
Cold plasma-catalytic reactor for exhaust purification was developed, where the reactor was consisted by two parts including dielectric barrier discharge system and metal honeycomb substrate catalyst.
研制了用于尾气净化的低温等离子体催化反应器，该反应器由介质阻挡放电型低温等离子发生器和金属蜂窝载体催化剂组成。
The Fe-based composite coatings on Q235 steel substrate were formed by plasma jet surface metallurgy.
采用等离子束表面冶金技术，在Q235钢表面制备了铁基合金涂层。
According to the difference of the configuration and substrate of SPWS, two different Surface Plasma Wave sensors exit, such as prism SPWS and optical fiber SPWS, which are studied in the paper.
按照结构和载体的不同该种传感器分为两类：棱镜表面等离子体波传感器传感器和光纤表面等离子体波传感器，本文分别对它们进行了研究。
The invention discloses a plasma display panel (PDP), comprising: front substrate with scan and sustain electrodes formed by transparent and bus electrodes;
本发明公开了一种等离子显示面板，包含：具有以透明电极与汇流电极形成的扫描电极与维持电极的正面基板；
The method is based on generating a charged corona plasma which is then introduced into a vacuum chamber to deposit the biomaterial onto a biased substrate.
该方法的基础上产生的费用电晕等离子体然后放入真空室引入存款基板上有偏见的生物材料。
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