In this paper, the nucleation process of diamond by filament CVD was analyzed, and enhanced flux of ions by negative substrate bias was investigated in theory.
木文对热灯丝cvd沉积金刚石膜的核化过程进行了分析，从理论上研究了负衬底偏压增强活性离子的流量。
In the paper, the enhancing process of diamond nucleation by negative substrate bias in hot filament CVD system was analyzed.
对利用热灯丝cvd沉积金刚石膜时负衬底偏压增强金刚石的核化过程进行了分析。
In this paper, the nucleation process of diamond by filament CVD was analyzed, and enhanced flux of ions by negative substrate bias was investigated in theory.
本文对热灯丝cvd沉积金刚石膜的核化过程进行了分析，从理论上研究了负衬底偏压增强活性离子的流量。
In addition, with the increasing distance between the filament and the substrate, the crystalline volume fraction and the grain size of poly-Si films notablely decrease.
另外，随着热丝与衬底间距的增大，沉积出的多晶硅薄膜样品的晶化率明显减小，薄膜的晶粒尺寸也相应减小。
Temperature profile in single and multi filament CVD system and temperature distribution in the substrate surface were analysised based on a simplified model and the addition principle respectively.
基于一简单模型和叠加原理，分别研究了单丝和多丝化学气相沉积(CVD)系统的温度场及基底表面的温度分布。
To further increase deposition rates, the filament array is biased negatively with respect to the substrate holder so that a DC plasma is also maintained between the substrate and filament array.
为进一步提高沉积速度，对灯丝组施加相对于基底夹持器的负偏压，使得在基底和灯丝组之间的DC等离子体也得以保持。
These large differences are caused by all the other parameters, such as filament temperature, filament substrate distance, gas speed in the reactor, etc., which can vary in wide ranges.
产生这些巨大差别的原因是诸如反应器中的丝极温度、丝极基体距离、气体速度等所有其它参数，这些参数的范围很宽。
In this paper, the diamond films were grown on the C_ (60) -coated silicon substrate by using hot-filament chemical vapor deposition technique. The diamond nucleation and growth were studied.
采用热丝化学气相沉积法在覆盖c _(60)膜的硅基片上沉积金刚石膜，研究了金刚石膜的成核与生长。
To provide a linear abrasive brush member, in which filament parts are hardly broken, a substrate part is excellent in deformability, and also, abrasion ability is excellent.
本发明提供了直线型研磨刷构件，其中刷丝部分几乎不断裂，基底部分具有极佳的变形性，并具有极佳的研磨能力。
To provide a linear abrasive brush member, in which filament parts are hardly broken, a substrate part is excellent in deformability, and also, abrasion ability is excellent.
本发明提供了直线型研磨刷构件，其中刷丝部分几乎不断裂，基底部分具有极佳的变形性，并具有极佳的研磨能力。
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