A new net-shape cathode sputtering target which has a simple structure and a high sputtering rate was put forward.
设计了一种网状阴极溅射靶，它是由多个空心阴极并列交叉组合而成。
It has the characteristic of working on higher pressure and lower voltage and having a high cathode sputtering rate.
它具有工作气压高，维持电压低，阴极溅射率高等特点。
A new multiple hollow cathode sputtering target which has a simple structure and a high sputtering rate, was put forward.
研制了一种由多个空心阴极并列组合而成的可直接作为溅射靶的多重空心阴极溅射靶。
During deposition process, the temperature of target increases for the bad cooling condition which increase the sputtering rate, so the metallic state sputtering is formed.
分析认为，在大电流、散热不良的情况下，靶面温度升高会极大增高靶材的被溅蚀速率，从而呈现金属态沉积。
Earlier this month, the Labor Department reported the U.S. unemployment rate was 9.5 percent, causing some to worry the country's economic recovery was sputtering.
本月早些时候，劳工部说，美国的失业率为9.5%。这使一些人担忧美国的经济恢复在减缓。
The compound fraction of target surface was gotten from the rate equations of sputtering and the transport equations of reactive particles .
由溅射速率方程和反应粒子输运方程得出了靶面化合物的覆盖度。
The influences of the sputtering power on deposition rate, film structure, and contact performance of the film prepared on CdZnTe substrate have been investigated.
系统地研究了溅射功率对沉积速率、薄膜结构、组织形貌及接触性能的影响。
Comparing with general sputtering method, this equipment has the advantages of decreasing the sputtering voltage and increasing the rate of deposition obviously.
与普通溅射方法相比，本设备的优点是：溅射电压大大降低，而淀积速率提高很多。
At low dose rate, several simulative curves were given when the sputtering of the intact sample molecules and the decomposition of the sample were taken into account.
在低剂量率时，分别给出了在考虑离子对样品的溅射和损伤的情况下的拟合曲线。
The concentration and deposition rate of the films are controllable with the optimization parameters on the RFMS-4 sputtering apparatus.
用RFMS-4射频磁控溅射仪制备纳米多层膜技术稳定可靠，在优化工艺条件下能保证薄膜成分和溅射速率的稳定性。
The results show that the deposition rate firstly increases linearly and then changes little with the increase of sputtering power.
结果表明，氧化铝薄膜的沉积速率随溅射功率的增大先几乎呈线性增大而后增速趋缓；
In particular, the amorphous titanium oxide is obtained by using the reactive sputtering method and via deposition at a low temperature and at a high film formation rate.
特别是利用反应性溅射法，在低温下以高成膜速度进行堆积，得到非晶的氧化钛。
For reactive sputtering, the gradient films with varying ratio of chemical component can be prepared by changing gas flow rate continuously.
对于反应溅射，可通过连续改变反应气体流量制得化学成分比连续变化的梯度薄膜。
Disclosed is a sputtering film-forming apparatus which is capable of forming a metal compound film with good characteristics at higher film-forming rate by a simple process at low cost.
提供能够以更快的成膜速度形成具有良好特性的金属化合物膜，并且能够简单地、低成本地构成的溅射成膜装置。
Earlier this month, the Labor Department reported the U. S. unemployment rate was 9.5 percent, causing some to worry the country's economic recovery was sputtering.
本月早些时候，劳工部说，美国的失业率为9.5%。这使一些人担忧美国的经济恢复在减缓。
The invention relates to a device for improving utilization rate of a high vacuum ion beam sputtering target material.
本发明涉及一种高真空离子束溅镀靶材利用率增强装置。
The transverse component of magnetic flux intensity is pivotal that affect the utilization rate of target material and quality of deposition film as well as the instability of the sputtering process.
利用有限元理论对靶表面磁通量密度的横向分量进行了模拟分析。
The magnetron sputtering device can effectively overcome the problem that the prior art is low in target material utilization rate and deposition rate.
其可以有效克服现有技术存在的靶材利用率低和沉积速率低的问题。
The magnetron sputtering device can effectively overcome the problem that the prior art is low in target material utilization rate and deposition rate.
其可以有效克服现有技术存在的靶材利用率低和沉积速率低的问题。
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