The electrically conductive leads of the sensor and the shunt structure can be formed in a common photolithographic masking and etching process so that they are self aligned with one another.
传感器的该导电引线和分路结构可以以公共光刻掩模化和蚀刻工艺形成从而它们彼此自对准。
The electrically conductive leads of the sensor and the shunt structure can be formed in a common photolithographic masking and etching process so that they are self aligned with one another.
传感器的该导电引线和分路结构可以以公共光刻掩模化和蚀刻工艺形成从而它们彼此自对准。
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